Ion implantation profiles can be approximated by a Dual-Pearson function. This function has nine parameters. Those parameters should be automatically computed for various implantation conditions to guide numerical simulation work flows. As a reference, ion implantation profiles extracted by Monte Carlo ion implantation simulation tools should be used. The envisioned software tool should feed the implantation conditions to the Monte Carlo simulator to produce the required implantation profiles. The goal is to set-up a software framework which can run Monte-Carlo simulation (which is already available) for various implant conditions, automatically extract the pearson parameters and create the tables for analytical ion implantation.
Requirements: GNU/Linux and C++. No previous knowledge on the physical background is required, only interest in developing engineering software. Interested candidates should get in touch with Josef Weinbub via email.