Contents

• List of Figures
• List of Tables
• 1. Introduction
  • 1.1 Existing Data Models
    • 1.1.1 VISTA
    • 1.1.2 DF-ISE
    • 1.1.3 TIF
    • 1.1.4 Silvaco
    • 1.1.5 SWR -- Semiconductor Wafer Representation
  • 1.2 Outline of this Thesis
  
  
• 2. Data Model Aspects for TCAD Simulators
  • 2.1 Requirements for a TCAD Data Model
  • 2.2 Wafer Description
    • 2.2.1 Data in a Persistent Wafer
    • 2.2.2 Operations on the Wafer Data
  • 2.3 Simulator Control
  • 2.4 Classification of Process Steps
  • 2.5 Concept of the WAFER-STATE-SERVER
  
  
• 3. WAFER-STATE-SERVER
  • 3.1 Configuration of the WAFER-STATE-SERVER
  • 3.2 I/O layer
    • 3.2.1 WSS -- WAFER-STATE-SERVER ASCII File Format
    • 3.2.2 HDF
    • 3.2.3 FEM
    • 3.2.4 PIF
    • 3.2.5 DF-ISE
  • 3.3 Meshing Layer
    • 3.3.1 TRIANGLE
    • 3.3.2 DELINK
    • 3.3.3 CGG
  • 3.4 Core Data-Structure Layer
    • 3.4.1 Required Functionality
    • 3.4.2 Oct-Tree
    • 3.4.3 Jump-and-Walk
    • 3.4.4 Quad-tree
    • 3.4.5 Binary-Tree
  • 3.5 Integration of Commercial Tools
  • 3.6 Visualization
  • 3.7 Implementation Details
    • 3.A.1 Garbage Collection
    • 3.A.2 Memory Management
  
  
• 4. Process Simulation Applications
  • 4.1 MCIMPL-- Three-Dimensional Monte-Carlo Ion Implantation Simulator
    • 4.1.1 Implementation Details
    • 4.1.2 Examples
  • 4.2 FEDOS -- Three-Dimensional Finite-Element Diffusion andOxidation Simulator
    • 4.2.1 Implementation Details
    • 4.2.2 Examples
  • 4.3 ETCH3D -- Topography Simulator
    • 4.3.1 Implementation Details
    • 4.3.2 Examples
  
  
• 5. Optimization for TCAD
  • 5.1 Introduction
    • 5.1.1 Inverse Modeling
    • 5.1.2 Calibration of Models
  • 5.2 Optimization Framework
  • 5.3 Gradient Based Optimization Methods
  • 5.4 Global Optimization Methods
    • 5.4.1 Genetic Optimization Algorithms
    • 5.4.2 Simulated Annealing Algorithms
  • 5.5 Combination of Local and Global Methods
  • 5.6 Examples
    • 5.6.1 Comparison of Local and Global Optimization Strategies
    • 5.6.2 Combination of Local and Global Optimization Strategies
    • 5.6.3 Calibration of a Model for Silicon Self-Interstitial Cluster Formation andDissolution
  
  
• 6. Summary
• A. The WAFER-STATE-SERVER API
  • A.1 Instantiating a Wafer Object
  • A.2 Saving Data in a Wafer Object to a File
  • A.3 Updating Data of a Wafer
  • A.4 Querying Data from the Wafer
    • A.4.1 Segment Related Methods
    • A.4.2 Surface Related Methods
    • A.4.3 General Methods of the Wafer Class
    • A.4.4 Methods of the Segment Class
    • A.4.5 Methods of Attribute Class
    • A.4.6 Data and Methods of the Quantity Class
  
  
• B. The WSS grammar
  • B.1 Notational Conventions
  • B.2 Definition of the WSS Grammar
    • B.2.1 INFO Section
    • B.2.2 POINTS Section
    • B.2.3 SEGMENTS Section
    • B.2.4 BOUNDARIES Section
    • B.2.5 Example WSS File
  • B.3 Definition of the Config File Grammar.
  
  
• C. Automated Selftest
  • C.1 Functionality of VTEST
  • C.2 Configuration of VTEST
    • C.2.1 Defining a Global VTEST Person
    • C.2.2 Defining the Web-Page for VTEST Warning Reports
    • C.2.3 Defining the Platforms for VTEST
    • C.2.4 Defining the Machine for a Certain Architecture
    • C.2.5 Defining the Packages to Test
    • C.2.6 Defining the Tasks to Run
    • C.2.7 Defining Timeouts for the Pre-Defined Tasks
    • C.2.8 Defining the Persons Responsible for a Package
    • C.2.9 Exempting People from Receiving a Report
  
  
• Bibliography

2003-03-27