4.4 Methodology Overview



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4.4 Methodology Overview

The 2D extraction procedure is described using an N-channel MOSFET. The same procedure can be applied to a P-channel device.

In the following sections, the results of each extraction step in the procedure are presented. These include the 1D MOS and source/drain diode profiling results used in the generation of the initial 2D guess and the 2D extraction results.

The method was applied to data collected from devices fabricated using a retrograde n-well, salicided dual-gate CMOS process [44][43].   All experimental C-V characteristics were obtained using an HP4145B parameter   analyzer and an HP 4275A LCR meter. The measurement frequency of the HP 4275A LCR meter was set to 100 kHz. The resolution of the system is around 0.1 fF. In order to reduce the noise level in the measured results, the experimental data for sub 0.5m devices were averaged for several measurements. As a result, the actual resolution of experimental data is better than 0.1 fF.



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Next: 4.5 One-Dimensional MOS Doping Up: 4 MOSFET Profiling Using Previous: 4.3 Profile Representation



Martin Stiftinger
Tue Aug 1 19:07:20 MET DST 1995