H. Kirchauer and S. Selberherr: Three-Dimensional Photolithography Simulation
Next:
References
Up:
Abstract
Previous:
6 Conclusion
Acknowledgment
This research project is significantly supported by
Austria Mikro Systeme International AG, Unterpremstätten, Austria
and
Christian Doppler Forschungsgesellschaft, Vienna, Austria.
H. Kirchauer and S. Selberherr: Three-Dimensional Photolithography Simulation