produces a result on a non-geometry-conforming
grid and tool
expects a geometry-conforming grid as input.
produces a result on a
single grid that spans multiple
segments (with different materials) and tool
expects
one grid for each segment (a wafer state compliant input, see also
Section 2.5.5).
creates a result attribute that must be merged
with an existing attribute which describes the previous
wafer state (e.g. additional Boron doping by ion implantation) to
produce a new, valid wafer state. Should the old or the new grid be
used to represent the superposition of the attributes?
This choice of the target grid is non-trivial. Especially when
different spatial regions are affected, a grid-merge is desirable.
creates a result
attribute that must be merged with the wafer state on a grid type that
deviates from the wafer state grid.
alters the geometry of the wafer state, but
does not care for the attributes and grid defined on the altered
geometry.
. A sub-geometry (a single segment or a rectangular
sub-domain) is fairly easily constructed, but the grid and attributes
on this sub-domain may be required as input for the tool.
There are many more grid-related problems and conflicts that do arise when multiple state-of-the-art simulation tools are used to simulate practical device fabrication steps (see also Chapter 7). Some of these problems can be solved by interpolation services. The problems 1-6 listed above, however, can not be solved satisfactory by interpolation alone. Moreover, the continued interpolation before and after each simulation step is a dangerous sink of accuracy and should be avoided when feasible alternatives exist.
Everything said so far is applicable for two-dimensional as well as three-dimensional simulation. Nevertheless, the conflicts are much more relevant for two-dimensional simulation, simply because a larger variety of two-dimensional simulators exist already and because other, more severe grid and geometry related problems dominate the field of research in the three-dimensional case.