4. List of Acronyms

CFL	Courant-Friedrichs-Levy
CMOS	Complementary Metal Oxide Semiconductor
CVD	Chemical Vapor Deposition
DIRECT	Dividing Rectangles
DNA	Deoxyribonucleic Acid
DOE	Design of Experiments
DRAM	Dynamic Random Access Memory
EGO	Extensible Genetic Optimizer
ELSA	Enhanced Level Set Applications
HDP	High Density Plasma
HPCVD	High Pressure Chemical Vapor Deposition
ILD	Interlevel Dielectric
LPCVD	Low Pressure Chemical Vapor Deposition
MOS	Metal Oxide Semiconductor
MOSFET	Metal Oxide Semiconductor Field Effect Transistor
PDE	Partial Differential Equation
PECVD	Plasma Enhanced Chemical Vapor Deposition
PIF	Profile Interchange Format
PVD	Physical Vapor Deposition
RSM	Response Surface Methodology
SEM	Scanning Electron Microscope
SIA	Semiconductor Industry Association
SIESTA	Simulation Environment for Semiconductor Technology Analysis
SIMS	Secondary Ion Mass Spectrometry
SRAM	Static Random Access Memory
RTA	Rapid Thermal Annealing
TCAD	Technology Computer Aided Design
TED	Transient Enhanced Diffusion
TEOS	Tetraethoxysilane, $\mathrm{Si(OC_2H_5)_4}$
ULSI	Ultra Large Scale Integration
VISTA	Viennese Integrated System for TCAD Applications
VLSI	Very Large Scale Integration