{"id":53,"date":"2022-07-21T10:35:01","date_gmt":"2022-07-21T10:35:01","guid":{"rendered":"https:\/\/www.iue.tuwien.ac.at\/promod\/?page_id=53"},"modified":"2023-02-10T11:26:54","modified_gmt":"2023-02-10T11:26:54","slug":"publications","status":"publish","type":"page","link":"https:\/\/www.iue.tuwien.ac.at\/promod\/publications\/","title":{"rendered":"Publications"},"content":{"rendered":"<div class=\"teachpress_pub_list\"><form name=\"tppublistform\" method=\"get\"><a name=\"tppubs\" id=\"tppubs\"><\/a><\/form><div class=\"teachpress_publication_list\"><h3 class=\"tp_h3\" id=\"tp_h3_Journal Articles\">Journal Articles<\/h3><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">28.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Tobias Reiter; Luiz Felipe Aguinsky; Fr\u00e2ncio Rodrigues; Josef Weinbub; Andreas H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('10','tp_links')\" style=\"cursor:pointer;\">Modeling the Impact of Incomplete Conformality During Atomic Layer Processing (invited)<\/a> <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">Solid-State Electronics, <\/span><span class=\"tp_pub_additional_volume\">vol. 211, <\/span><span class=\"tp_pub_additional_pages\">pp. 108816, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>, <span class=\"tp_pub_additional_issn\">ISSN: 0038-1101<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_10\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('10','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_10\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('10','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_10\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{reiter2024modeling,<br \/>\r\ntitle = {Modeling the Impact of Incomplete Conformality During Atomic Layer Processing (invited)},<br \/>\r\nauthor = {Tobias Reiter and Luiz Felipe Aguinsky and Fr\u00e2ncio Rodrigues and Josef Weinbub and Andreas H\u00f6ssinger and Lado Filipovic},<br \/>\r\ndoi = {10.1016\/j.sse.2023.108816},<br \/>\r\nissn = {0038-1101},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\njournal = {Solid-State Electronics},<br \/>\r\nvolume = {211},<br \/>\r\npages = {108816},<br \/>\r\npublisher = {Elsevier BV},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('10','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_10\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.1016\/j.sse.2023.108816\" title=\"Follow DOI:10.1016\/j.sse.2023.108816\" target=\"_blank\">doi:10.1016\/j.sse.2023.108816<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('10','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">27.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Abel Garcia-Barrientos; Natalia Nikolova; Lado Filipovic; Edmundo A. Gutierrez-D.; Victoria Serrano; Sharon Macias-Velasquez; Sarai Zarate-Galvez<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('12','tp_links')\" style=\"cursor:pointer;\">Numerical Simulations of Space Charge Waves Amplification Using Negative Differential Conductance in Strained Si\/SiGe at 4.2 K<\/a> <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">Crystals, <\/span><span class=\"tp_pub_additional_volume\">vol. 13, <\/span><span class=\"tp_pub_additional_number\">no. 9, <\/span><span class=\"tp_pub_additional_pages\">pp. 1398, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>, <span class=\"tp_pub_additional_issn\">ISSN: 2073-4352<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_12\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('12','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_12\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('12','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_12\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{garciabarrientos2023numerical,<br \/>\r\ntitle = {Numerical Simulations of Space Charge Waves Amplification Using Negative Differential Conductance in Strained Si\/SiGe at 4.2 K},<br \/>\r\nauthor = {Abel Garcia-Barrientos and Natalia Nikolova and Lado Filipovic and Edmundo A. Gutierrez-D. and Victoria Serrano and Sharon Macias-Velasquez and Sarai Zarate-Galvez},<br \/>\r\ndoi = {10.3390\/cryst13091398},<br \/>\r\nissn = {2073-4352},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-09-01},<br \/>\r\njournal = {Crystals},<br \/>\r\nvolume = {13},<br \/>\r\nnumber = {9},<br \/>\r\npages = {1398},<br \/>\r\npublisher = {MDPI AG},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('12','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_12\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.3390\/cryst13091398\" title=\"Follow DOI:10.3390\/cryst13091398\" target=\"_blank\">doi:10.3390\/cryst13091398<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('12','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">26.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Sarai Zarate-Galvez; Abel Garcia-Barrientos; Luis Felipe Lastras-Martinez; Marco Cardenas-Juarez; Sharon Macias-Velasquez; Lado Filipovic; Armando Arce-Casas<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('13','tp_links')\" style=\"cursor:pointer;\">Optimization of Doping Concentration to Obtain High Internal Quantum Efficiency and Wavelength Stability in An InGaN\/GaN Blue Light-Emitting Diode<\/a> <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">ECS Journal of Solid State Science and Technology, <\/span><span class=\"tp_pub_additional_volume\">vol. 12, <\/span><span class=\"tp_pub_additional_number\">no. 7, <\/span><span class=\"tp_pub_additional_pages\">pp. 076014, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>, <span class=\"tp_pub_additional_issn\">ISSN: 2162-8777<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_13\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('13','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_13\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('13','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_13\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{zarategalvez2023optimization,<br \/>\r\ntitle = {Optimization of Doping Concentration to Obtain High Internal Quantum Efficiency and Wavelength Stability in An InGaN\/GaN Blue Light-Emitting Diode},<br \/>\r\nauthor = {Sarai Zarate-Galvez and Abel Garcia-Barrientos and Luis Felipe Lastras-Martinez and Marco Cardenas-Juarez and Sharon Macias-Velasquez and Lado Filipovic and Armando Arce-Casas},<br \/>\r\ndoi = {10.1149\/2162-8777\/ace7c4},<br \/>\r\nissn = {2162-8777},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-07-01},<br \/>\r\njournal = {ECS Journal of Solid State Science and Technology},<br \/>\r\nvolume = {12},<br \/>\r\nnumber = {7},<br \/>\r\npages = {076014},<br \/>\r\npublisher = {The Electrochemical Society},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('13','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_13\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.1149\/2162-8777\/ace7c4\" title=\"Follow DOI:10.1149\/2162-8777\/ace7c4\" target=\"_blank\">doi:10.1149\/2162-8777\/ace7c4<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('13','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">25.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Arash Yazdanpanah Goharrizi; Ali Molajani Barzoki; Siegfried Selberherr; Lado Filipovic<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('16','tp_links')\" style=\"cursor:pointer;\">A Theoretical Study of Armchair Antimonene Nanoribbons in the Presence of Uniaxial Strain Based on First-Principles Calculations<\/a> <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">ACS Applied Electronic Materials, <\/span><span class=\"tp_pub_additional_volume\">vol. 5, <\/span><span class=\"tp_pub_additional_number\">no. 8, <\/span><span class=\"tp_pub_additional_pages\">pp. 4514\u20134522, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>, <span class=\"tp_pub_additional_issn\">ISSN: 2637-6113<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_16\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('16','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_16\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('16','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_16\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{yazdanpanahgoharrizi2023theoretical,<br \/>\r\ntitle = {A Theoretical Study of Armchair Antimonene Nanoribbons in the Presence of Uniaxial Strain Based on First-Principles Calculations},<br \/>\r\nauthor = {Arash Yazdanpanah Goharrizi and Ali Molajani Barzoki and Siegfried Selberherr and Lado Filipovic},<br \/>\r\ndoi = {10.1021\/acsaelm.3c00686},<br \/>\r\nissn = {2637-6113},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-07-01},<br \/>\r\njournal = {ACS Applied Electronic Materials},<br \/>\r\nvolume = {5},<br \/>\r\nnumber = {8},<br \/>\r\npages = {4514--4522},<br \/>\r\npublisher = {American Chemical Society (ACS)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('16','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_16\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.1021\/acsaelm.3c00686\" title=\"Follow DOI:10.1021\/acsaelm.3c00686\" target=\"_blank\">doi:10.1021\/acsaelm.3c00686<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('16','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">24.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Tim Faber; Lado Filipovic; L. Jan Anton Koster<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('14','tp_links')\" style=\"cursor:pointer;\">The Role of Thermalization in the Cooling Dynamics of Hot Carrier Solar Cells<\/a> <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">Solar RRL, <\/span><span class=\"tp_pub_additional_volume\">vol. 7, <\/span><span class=\"tp_pub_additional_number\">no. 13, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>, <span class=\"tp_pub_additional_issn\">ISSN: 2367-198X<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_14\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('14','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_14\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('14','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_14\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{faber2023role,<br \/>\r\ntitle = {The Role of Thermalization in the Cooling Dynamics of Hot Carrier Solar Cells},<br \/>\r\nauthor = {Tim Faber and Lado Filipovic and L. Jan Anton Koster},<br \/>\r\ndoi = {10.1002\/solr.202300140},<br \/>\r\nissn = {2367-198X},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-05-01},<br \/>\r\njournal = {Solar RRL},<br \/>\r\nvolume = {7},<br \/>\r\nnumber = {13},<br \/>\r\npublisher = {Wiley},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('14','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_14\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.1002\/solr.202300140\" title=\"Follow DOI:10.1002\/solr.202300140\" target=\"_blank\">doi:10.1002\/solr.202300140<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('14','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">23.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Josip Bobinac; Tobias Reiter; Julius Piso; Xaver Klemenschits; Oskar Baumgartner; Zlatan Stanojevic; Georg Strof; Markus Karner; Lado Filipovic<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('11','tp_links')\" style=\"cursor:pointer;\">Effect of Mask Geometry Variation on Plasma Etching Profiles<\/a> <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">Micromachines, <\/span><span class=\"tp_pub_additional_volume\">vol. 14, <\/span><span class=\"tp_pub_additional_number\">no. 3, <\/span><span class=\"tp_pub_additional_pages\">pp. 665, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>, <span class=\"tp_pub_additional_issn\">ISSN: 2072-666X<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_11\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('11','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_11\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('11','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_11\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{bobinac2023effect,<br \/>\r\ntitle = {Effect of Mask Geometry Variation on Plasma Etching Profiles},<br \/>\r\nauthor = {Josip Bobinac and Tobias Reiter and Julius Piso and Xaver Klemenschits and Oskar Baumgartner and Zlatan Stanojevic and Georg Strof and Markus Karner and Lado Filipovic},<br \/>\r\ndoi = {10.3390\/mi14030665},<br \/>\r\nissn = {2072-666X},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-03-01},<br \/>\r\njournal = {Micromachines},<br \/>\r\nvolume = {14},<br \/>\r\nnumber = {3},<br \/>\r\npages = {665},<br \/>\r\npublisher = {MDPI AG},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('11','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_11\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.3390\/mi14030665\" title=\"Follow DOI:10.3390\/mi14030665\" target=\"_blank\">doi:10.3390\/mi14030665<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('11','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">22.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Ziyi Hu; Junjie Li; Rui Chen; Dashan Shang; Yayi Wei; Zhongrui Wang; Ling Li; Lado Filipovic<\/p><p class=\"tp_pub_title\">A two-step dry etching model for non-uniform etching profile in gate-all-around field-effect transistor manufacturing (submitted) <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">ACS Applied Electronic Materials, <\/span><span class=\"tp_pub_additional_year\">0000<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_9\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('9','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_9\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{hu2024twostep,<br \/>\r\ntitle = {A two-step dry etching model for non-uniform etching profile in gate-all-around field-effect transistor manufacturing (submitted)},<br \/>\r\nauthor = {Ziyi Hu and Junjie Li and Rui Chen and Dashan Shang and Yayi Wei and Zhongrui Wang and Ling Li and Lado Filipovic},<br \/>\r\njournal = {ACS Applied Electronic Materials},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('9','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_article\"><div class=\"tp_pub_number\">21.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Tim Faber; Lado Filipovic; L. Jan Anton Koster<\/p><p class=\"tp_pub_title\">The Hot Phonon Bottleneck Effect in Metal Halide Perovskites (submitted) <span class=\"tp_pub_type article\">Journal Article<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_journal\">ACS Energy Letters, <\/span><span class=\"tp_pub_additional_year\">0000<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_15\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('15','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_15\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@article{faber2024hot,<br \/>\r\ntitle = {The Hot Phonon Bottleneck Effect in Metal Halide Perovskites (submitted)},<br \/>\r\nauthor = {Tim Faber and Lado Filipovic and L. Jan Anton Koster},<br \/>\r\njournal = {ACS Energy Letters},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {article}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('15','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><h3 class=\"tp_h3\" id=\"tp_h3_Inproceedings\">Inproceedings<\/h3><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">20.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Robert Stella; Sabine Leroch; Andreas H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\">Atomistic Study of 4H-SiC Using Ab Initio and Machine Learning Techniques (invited) <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Joint International Meeting of The Electrochemical Society (ECS), The Electrochemical Society of Japan (ECSJ), and The Korean Electrochemical Society (KECS) - PRiME 2024, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_17\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('17','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_17\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{stella2024prime,<br \/>\r\ntitle = {Atomistic Study of 4H-SiC Using Ab Initio and Machine Learning Techniques (invited)},<br \/>\r\nauthor = {Robert Stella and Sabine Leroch and Andreas H\u00f6ssinger and Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-10-01},<br \/>\r\nbooktitle = {Joint International Meeting of The Electrochemical Society (ECS), The Electrochemical Society of Japan (ECSJ), and The Korean Electrochemical Society (KECS) - PRiME 2024},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('17','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">19.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic<\/p><p class=\"tp_pub_title\">Efficient Multi-Scale Modeling of Semiconductor Device Fabrication (invited) <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of the 5th International Congress on Advanced Materials Sciences and Engineering (AMSE), <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_24\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('24','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_24\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024efficient,<br \/>\r\ntitle = {Efficient Multi-Scale Modeling of Semiconductor Device Fabrication (invited)},<br \/>\r\nauthor = {Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {Proceedings of the 5th International Congress on Advanced Materials Sciences and Engineering (AMSE)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('24','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">18.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic<\/p><p class=\"tp_pub_title\">Semiconductor Fabrication at Multiple Time and Length Scales (invited) <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of Austrochip - Workshop on Microelectronics, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_25\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('25','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_25\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024semiconductor,<br \/>\r\ntitle = {Semiconductor Fabrication at Multiple Time and Length Scales (invited)},<br \/>\r\nauthor = {Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {Proceedings of Austrochip - Workshop on Microelectronics},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('25','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">17.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic<\/p><p class=\"tp_pub_title\">Modeling and Simulation of ALD in a Level Set Framework (invited) <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of the 7th International Conference ALD for Industry, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_26\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('26','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_26\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024modelingALD,<br \/>\r\ntitle = {Modeling and Simulation of ALD in a Level Set Framework (invited)},<br \/>\r\nauthor = {Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {Proceedings of the 7th International Conference ALD for Industry},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('26','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">16.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic<\/p><p class=\"tp_pub_title\">Merging Reactor and Feature Scales for Plasma Etch Modeling (invited) <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of IEEE Nanotechnology Council - IEEE NANO 2024, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_27\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('27','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_27\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024merging,<br \/>\r\ntitle = {Merging Reactor and Feature Scales for Plasma Etch Modeling (invited)},<br \/>\r\nauthor = {Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {Proceedings of IEEE Nanotechnology Council - IEEE NANO 2024},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('27','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">15.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic; Balazs Bamer; Sabine Leroch; Tobias Reiter; Robert Stella; Andreas H\u00f6ssinger<\/p><p class=\"tp_pub_title\">Multi-Scale Process TCAD for Advanced Semiconductor Fabrication <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Book of Abstracts MESS24 - Microelectronic Systems Symposium, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_28\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('28','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_28\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024multiscale,<br \/>\r\ntitle = {Multi-Scale Process TCAD for Advanced Semiconductor Fabrication},<br \/>\r\nauthor = {Lado Filipovic and Balazs Bamer and Sabine Leroch and Tobias Reiter and Robert Stella and Andreas H\u00f6ssinger},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nurldate = {2024-01-01},<br \/>\r\nbooktitle = {Book of Abstracts MESS24 - Microelectronic Systems Symposium},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('28','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">14.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Balazs Bamer; Andreas H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\">Cluster-Based Model for Dopant Activation in SiC <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Book of Abstracts MESS24 - Microelectronic Systems Symposium, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_29\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('29','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_29\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{bamer2024cluster,<br \/>\r\ntitle = {Cluster-Based Model for Dopant Activation in SiC},<br \/>\r\nauthor = {Balazs Bamer and Andreas H\u00f6ssinger and Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nurldate = {2024-01-01},<br \/>\r\nbooktitle = {Book of Abstracts MESS24 - Microelectronic Systems Symposium},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('29','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">13.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic; Tobias Reiter<\/p><p class=\"tp_pub_title\">Multi-Scale Model for High Aspect Ratio TiN Etching in a Cl$_2$\/Ar Inductively Coupled Plasma <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of the Plasma Processing and Technology International Conference (PlasmaTech), <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_30\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('30','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_30\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024plasmatech,<br \/>\r\ntitle = {Multi-Scale Model for High Aspect Ratio TiN Etching in a Cl$_2$\/Ar Inductively Coupled Plasma},<br \/>\r\nauthor = {Lado Filipovic and Tobias Reiter},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {Proceedings of the Plasma Processing and Technology International Conference (PlasmaTech)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('30','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">12.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic; Tobias Reiter<\/p><p class=\"tp_pub_title\">Spline Interpolation-Based Multi-Scale Model for Etching in a Chlorine-Argon Inductively Coupled Plasma <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of the 20th International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM), <\/span><span class=\"tp_pub_additional_year\">2024<\/span><span class=\"tp_pub_additional_note\">, (Part of Winter Simulation Conference (WSC))<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_31\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('31','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_31\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024spline,<br \/>\r\ntitle = {Spline Interpolation-Based Multi-Scale Model for Etching in a Chlorine-Argon Inductively Coupled Plasma},<br \/>\r\nauthor = {Lado Filipovic and Tobias Reiter},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {Proceedings of the 20th International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM)},<br \/>\r\nnote = {Part of Winter Simulation Conference (WSC)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('31','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">11.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Ziyi Hu; Lado Filipovic; Junjie Li; Lingfei Wang; Zhicheng Wu; Rui Chen; Yayi Wei; Ling Li<\/p><p class=\"tp_pub_title\">Modeling Non-Uniformity During Two-Step Dry Etching of Si\/SiGe Stacks for Gate-All-Around FETs <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_32\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('32','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_32\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{hu2024modeling,<br \/>\r\ntitle = {Modeling Non-Uniformity During Two-Step Dry Etching of Si\/SiGe Stacks for Gate-All-Around FETs},<br \/>\r\nauthor = {Ziyi Hu and Lado Filipovic and Junjie Li and Lingfei Wang and Zhicheng Wu and Rui Chen and Yayi Wei and Ling Li},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('32','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">10.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Sabine Leroch; Robert Stella; Andreas H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\">MD Simulation of Epitaxial Recrystallization and Defect Structure of Al-Implanted 4H-SiC <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_33\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('33','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_33\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{leroch2024md,<br \/>\r\ntitle = {MD Simulation of Epitaxial Recrystallization and Defect Structure of Al-Implanted 4H-SiC},<br \/>\r\nauthor = {Sabine Leroch and Robert Stella and Andreas H\u00f6ssinger and Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('33','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">9.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic; Tobias Reiter; Julius Piso; Roman Kostal<\/p><p class=\"tp_pub_title\">Equipment-Informed Machine Learning-Assisted Feature-Scale Plasma Etching Model <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_34\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('34','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_34\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2024equipment,<br \/>\r\ntitle = {Equipment-Informed Machine Learning-Assisted Feature-Scale Plasma Etching Model},<br \/>\r\nauthor = {Lado Filipovic and Tobias Reiter and Julius Piso and Roman Kostal},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('34','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">8.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">T. Reiter; A. Toifl; S. W. Kong; A. H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\">Impact of Ion Energy and Yield in Oblique Ion Beam Etching Process for Blazed Gratings <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_35\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('35','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_35\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{reiter2024impact,<br \/>\r\ntitle = {Impact of Ion Energy and Yield in Oblique Ion Beam Etching Process for Blazed Gratings},<br \/>\r\nauthor = {T. Reiter and A. Toifl and S. W. Kong and A. H\u00f6ssinger and Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nbooktitle = {2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('35','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">7.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Balazs Bamer; Andreas H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\">Cluster-Based Multivariate Spline Model for Dopant Activation in SiC <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Book of Abstracts AMaSiS 2024 - Applied Mathematics and Simulation for Semiconductor Devices, <\/span><span class=\"tp_pub_additional_year\">2024<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_36\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('36','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_36\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{bamer2024clusterAMASIS,<br \/>\r\ntitle = {Cluster-Based Multivariate Spline Model for Dopant Activation in SiC},<br \/>\r\nauthor = {Balazs Bamer and Andreas H\u00f6ssinger and Lado Filipovic},<br \/>\r\nyear  = {2024},<br \/>\r\ndate = {2024-01-01},<br \/>\r\nurldate = {2024-01-01},<br \/>\r\nbooktitle = {Book of Abstracts AMaSiS 2024 - Applied Mathematics and Simulation for Semiconductor Devices},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('36','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">6.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic; Roberto Lacerda Orio<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('23','tp_links')\" style=\"cursor:pointer;\">Electromigration Reliability of Buried Power Rails in Vertically Stacked Devices<\/a> <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2023 IEEE International Integrated Reliability Workshop (IIRW), <\/span><span class=\"tp_pub_additional_publisher\">IEEE, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_23\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('23','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_23\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('23','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_23\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2023electromigration,<br \/>\r\ntitle = {Electromigration Reliability of Buried Power Rails in Vertically Stacked Devices},<br \/>\r\nauthor = {Lado Filipovic and Roberto Lacerda Orio},<br \/>\r\ndoi = {10.1109\/iirw59383.2023.10477689},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-10-01},<br \/>\r\nbooktitle = {2023 IEEE International Integrated Reliability Workshop (IIRW)},<br \/>\r\npublisher = {IEEE},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('23','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_23\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.1109\/iirw59383.2023.10477689\" title=\"Follow DOI:10.1109\/iirw59383.2023.10477689\" target=\"_blank\">doi:10.1109\/iirw59383.2023.10477689<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('23','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">5.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">T. Reiter; A. Toifl; A. H\u00f6ssinger; L. Filipovic<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('19','tp_links')\" style=\"cursor:pointer;\">Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures<\/a> <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_publisher\">IEEE, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_19\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('19','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_19\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('19','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_19\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{reiter2023modeling,<br \/>\r\ntitle = {Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures},<br \/>\r\nauthor = {T. Reiter and A. Toifl and A. H\u00f6ssinger and L. Filipovic},<br \/>\r\ndoi = {10.23919\/sispad57422.2023.10319506},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-09-01},<br \/>\r\nbooktitle = {2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\npublisher = {IEEE},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('19','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_19\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.23919\/sispad57422.2023.10319506\" title=\"Follow DOI:10.23919\/sispad57422.2023.10319506\" target=\"_blank\">doi:10.23919\/sispad57422.2023.10319506<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('19','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">4.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Sabine Leroch; Robert Stella; Andreas H\u00f6ssinger; Lado Filipovic<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('20','tp_links')\" style=\"cursor:pointer;\">Molecular Dynamics Study of Al Implantation in 4H-SiC<\/a> <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_publisher\">IEEE, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_20\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('20','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_20\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('20','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_20\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{leroch2023molecular,<br \/>\r\ntitle = {Molecular Dynamics Study of Al Implantation in 4H-SiC},<br \/>\r\nauthor = {Sabine Leroch and Robert Stella and Andreas H\u00f6ssinger and Lado Filipovic},<br \/>\r\ndoi = {10.23919\/sispad57422.2023.10319554},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-09-01},<br \/>\r\nbooktitle = {2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\npublisher = {IEEE},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('20','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_20\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.23919\/sispad57422.2023.10319554\" title=\"Follow DOI:10.23919\/sispad57422.2023.10319554\" target=\"_blank\">doi:10.23919\/sispad57422.2023.10319554<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('20','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">3.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Lado Filipovic; Josip Bobinac; Julius Piso; Tobias Reiter<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('21','tp_links')\" style=\"cursor:pointer;\">Physics-Informed Compact Model for SF$_6$\/O$_2$ Plasma Etching<\/a> <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), <\/span><span class=\"tp_pub_additional_publisher\">IEEE, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_21\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('21','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_21\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('21','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_21\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2023physics,<br \/>\r\ntitle = {Physics-Informed Compact Model for SF$_6$\/O$_2$ Plasma Etching},<br \/>\r\nauthor = {Lado Filipovic and Josip Bobinac and Julius Piso and Tobias Reiter},<br \/>\r\ndoi = {10.23919\/sispad57422.2023.10319479},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-09-01},<br \/>\r\nbooktitle = {2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)},<br \/>\r\npublisher = {IEEE},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('21','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_21\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.23919\/sispad57422.2023.10319479\" title=\"Follow DOI:10.23919\/sispad57422.2023.10319479\" target=\"_blank\">doi:10.23919\/sispad57422.2023.10319479<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('21','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">2.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">Tobias Reiter; Lado Filipovic<\/p><p class=\"tp_pub_title\"><a class=\"tp_title_link\" onclick=\"teachpress_pub_showhide('18','tp_links')\" style=\"cursor:pointer;\">Fast 3D Flux Calculation Using Monte Carlo Ray Tracing on GPUs<\/a> <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Proceedings of the International Conference on Microelectronic Devices and Technologies (MicDAT '2023), <\/span><span class=\"tp_pub_additional_pages\">pp. 67\u201372, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_resource_link\"><a id=\"tp_links_sh_18\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('18','tp_links')\" title=\"Show links and resources\" style=\"cursor:pointer;\">Links<\/a><\/span> | <span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_18\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('18','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_18\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{reiter2023fast,<br \/>\r\ntitle = {Fast 3D Flux Calculation Using Monte Carlo Ray Tracing on GPUs},<br \/>\r\nauthor = {Tobias Reiter and Lado Filipovic},<br \/>\r\ndoi = {10.13140\/RG.2.2.13265.71524},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-01-01},<br \/>\r\nbooktitle = {Proceedings of the International Conference on Microelectronic Devices and Technologies (MicDAT '2023)},<br \/>\r\npages = {67--72},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('18','tp_bibtex')\">Close<\/a><\/p><\/div><div class=\"tp_links\" id=\"tp_links_18\" style=\"display:none;\"><div class=\"tp_links_entry\"><ul class=\"tp_pub_list\"><li><i class=\"ai ai-doi\"><\/i><a class=\"tp_pub_list\" href=\"https:\/\/dx.doi.org\/10.13140\/RG.2.2.13265.71524\" title=\"Follow DOI:10.13140\/RG.2.2.13265.71524\" target=\"_blank\">doi:10.13140\/RG.2.2.13265.71524<\/a><\/li><\/ul><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('18','tp_links')\">Close<\/a><\/p><\/div><\/div><\/div><div class=\"tp_publication tp_publication_inproceedings\"><div class=\"tp_pub_number\">1.<\/div><div class=\"tp_pub_info\"><p class=\"tp_pub_author\">L. Filipovic; T. Reiter; X. Klemenschits; S. Leroch; R. Stella; O. Baumgartner; A. H\u00f6ssinger<\/p><p class=\"tp_pub_title\">Process Simulation in Micro- And Nano-Electronics (invited) <span class=\"tp_pub_type inproceedings\">Inproceedings<\/span> <\/p><p class=\"tp_pub_additional\"><span class=\"tp_pub_additional_in\">In: <\/span><span class=\"tp_pub_additional_booktitle\">Book of abstracts of the International Workshop on Computational Nanotechnology, <\/span><span class=\"tp_pub_additional_pages\">pp. 38\u201339, <\/span><span class=\"tp_pub_additional_year\">2023<\/span>.<\/p><p class=\"tp_pub_menu\"><span class=\"tp_bibtex_link\"><a id=\"tp_bibtex_sh_22\" class=\"tp_show\" onclick=\"teachpress_pub_showhide('22','tp_bibtex')\" title=\"Show BibTeX entry\" style=\"cursor:pointer;\">BibTeX<\/a><\/span><\/p><div class=\"tp_bibtex\" id=\"tp_bibtex_22\" style=\"display:none;\"><div class=\"tp_bibtex_entry\"><pre>@inproceedings{filipovic2023process,<br \/>\r\ntitle = {Process Simulation in Micro- And Nano-Electronics (invited)},<br \/>\r\nauthor = {L. Filipovic and T. Reiter and X. Klemenschits and S. Leroch and R. Stella and O. Baumgartner and A. H\u00f6ssinger},<br \/>\r\nyear  = {2023},<br \/>\r\ndate = {2023-01-01},<br \/>\r\nbooktitle = {Book of abstracts of the International Workshop on Computational Nanotechnology},<br \/>\r\npages = {38--39},<br \/>\r\nkeywords = {},<br \/>\r\npubstate = {published},<br \/>\r\ntppubtype = {inproceedings}<br \/>\r\n}<br \/>\r\n<\/pre><\/div><p class=\"tp_close_menu\"><a class=\"tp_close\" onclick=\"teachpress_pub_showhide('22','tp_bibtex')\">Close<\/a><\/p><\/div><\/div><\/div><\/div><\/div>\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-53","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/pages\/53","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/comments?post=53"}],"version-history":[{"count":2,"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/pages\/53\/revisions"}],"predecessor-version":[{"id":60,"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/pages\/53\/revisions\/60"}],"wp:attachment":[{"href":"https:\/\/www.iue.tuwien.ac.at\/promod\/wp-json\/wp\/v2\/media?parent=53"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}