Publications Walter Bohmayr
12 recordsPublications in Scientific Journals
2. | W. Bohmayr, A. Burenkov, J. Lorenz, H. Ryssel, S. Selberherr: "Monte Carlo Simulation of Silicon Amorphization during Ion Implantation"; IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 17 (1998), 12; 1236 - 1243. https://doi.org/10.1109/43.736563 | |
1. | W. Bohmayr, A. Burenkov, J. Lorenz, H. Ryssel, S. Selberherr: "Trajectory Split Method for Monte Carlo Simulation of Ion Implantation"; IEEE Transactions on Semiconductor Manufacturing, 8 (1995), 4; 402 - 407. https://doi.org/10.1109/66.475181 | |
Talks and Poster Presentations (with Proceedings-Entry)
7. | W. Bohmayr, A. Burenkov, J. Lorenz, H. Ryssel, S. Selberherr: "Monte Carlo Simulation of Silicon Amorphization During Ion Implantation"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Tokyo, Japan; 1996-09-02 - 1996-09-04; in: "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (1996), ISBN: 0-7803-2745-4; 17 - 18. https://doi.org/10.1109/SISPAD.1996.865252 | |
6. | E. Leitner, W. Bohmayr, P. Fleischmann, E. Strasser, S. Selberherr: "3D TCAD at TU Vienna"; Talk: 3-Dimensional Process Simulation Workshop, Erlangen (invited); 1995-09-05; in: "Proceedings 3-Dimensional Process Simulation Workshop", (1995), ISBN: 3-211-82741-2; 136 - 161. https://doi.org/10.1007/978-3-7091-6905-6_7 | |
5. | A. Burenkov, W. Bohmayr, J. Lorenz, H. Ryssel, S. Selberherr: "Analytical Model for Phosphorus Large Angle Tilted Implantation"; Talk: International Conference on the Simulation of Semiconductor Devices and Processes (SISDEP), Erlangen; 1995-09-06 - 1995-09-08; in: "Proceedings SISDEP 95 Conference", (1995), ISBN: 3-211-82736-6; 488 - 491. https://doi.org/10.1007/978-3-7091-6619-2_118 | |
4. | W. Bohmayr, S. Selberherr: "Effiziente Methoden für die Monte Carlo Simulation der Ionenimplantation in multidimensionale kristalline Halbleiterstrukturen"; Talk: Seminar Grundlagen und Technologie elektronischer Bauelemente, Grossarl; 1995-04-05 - 1995-04-08; in: "Tagungsbericht Seminar Grundlagen und Technologie elektronischer Bauelemente", (1995), ISBN: 3-901578-01-3; 63 - 66. | |
3. | W. Bohmayr, S. Selberherr: "Investigation of Channeling in Field Oxide Corners by Three-Dimensional Monte Carlo Simulation of Ion Implantation"; Talk: International Conference on Solid State and Integrated Circuit Technology (ICSICT), Peking; 1995-09-24 - 1995-09-28; in: "Proceedings Solid-State and Integrated-Circuit Technology Conference", (1995), 304 - 306. | |
2. | W. Bohmayr, A. Burenkov, J. Lorenz, H. Ryssel, S. Selberherr: "Statistical Accuracy and CPU Time Characteristic of Three Trajectory Split Methods for Monte Carlo Simulation of Ion Implantation"; Talk: International Conference on the Simulation of Semiconductor Devices and Processes (SISDEP), Erlangen; 1995-09-06 - 1995-09-08; in: "Proceedings SISDEP 95 Conference", (1995), ISBN: 3-211-82736-6; 492 - 495. https://doi.org/10.1007/978-3-7091-6619-2_119 | |
1. | W. Bohmayr, S. Selberherr: "Trajectory Split Method for Monte Carlo Simulation of Ion Implantation Demonstrated by Three-Dimensional Poly-Buffered LOCOS Field Oxide Corners"; Talk: VLSI Technology, Systems and Applications Symposium (VLSITSA), Taipei; 1995-05-31 - 1995-06-02; in: "Proceedings VLSI Technology, Systems and Applications Symposium", (1995), ISBN: 0-7803-2773-x; 104 - 107. | |
Doctor's Theses (authored and supervised)
1. | W. Bohmayr: "Simulation der Ionenimplantation in kristalline Siliziumstrukturen"; Supervisor, Reviewer: S. Selberherr, W. Fallmann; Institut für Mikroelektronik, 1996; oral examination: 1996-10-28. | |
Scientific Reports
2. | W. Bohmayr, F. Fasching, G. Rieger, S. Selberherr, T. Simlinger: "VISTA Status Report December 1994"; 1994; 26 pages. | |
1. | W. Bohmayr, S. Halama, C. Pichler, S. Selberherr, T. Simlinger, E. Strasser, W. Tuppa: "VISTA Status Report June 1994"; 1994; 25 pages. | |