Publications Otmar Ertl
12 records
| 2. | O. Ertl, S. Selberherr: "Three-Dimensional Level Set Based Bosch Process Simulations using Ray Tracing for Flux Calculation"; Microelectronic Engineering, 87, (2010), 20 - 29 doi:10.1016/j.mee.2009.05.011. BibTeX |
| 1. | O. Ertl, S. Selberherr: "A Fast Level Set Framework for Large Three-Dimensional Topography Simulations"; Computer Physics Communications, 180, (2009), 1242 - 1250 doi:10.1016/j.cpc.2009.02.002. BibTeX |
| 7. | L. Filipovic, O. Ertl, S. Selberherr: "Parallelization Strategy for Hierarchical Run Length Encoded Data Structures"; Talk: IASTED International Conference on Parallel and Distributed Computing and Networks (PDCN 2011), Innsbruck; 2011-02-15 - 2011-02-17; in "Proceedings of the IASTED International Conference on Parallel and Distributed Computing and Networks (PDCN 2011)", (2011), ISBN: 978-0-88986-864-9, 131 - 138 doi:10.2316/P.2011.719-045. BibTeX |
| 6. | O. Ertl, L. Filipovic, S. Selberherr: "Three-Dimensional Simulation of Focused Ion Beam Processing Using the Level Set Method"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Bologna, Italy; 2010-09-06 - 2010-09-08; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2010), ISBN: 978-1-4244-7700-5, 49 - 52 doi:10.1109/SISPAD.2010.5604573. BibTeX |
| 5. | O. Ertl, S. Selberherr: "A Fast Void Detection Algorithm for Three-Dimensional Deposition Simulation"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), San Diego, CA, USA; 2009-09-09 - 2009-09-11; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2009), ISBN: 978-1-4244-3947-8, 174 - 177 doi:10.1109/SISPAD.2009.5290221. BibTeX |
| 4. | O. Ertl, S. Selberherr: "Three-Dimensional Plasma Etching Simulation using Advanced Ray Tracing and Level Set Techniques"; Talk: Intl. Symposium on Microelectronics Technology and Devices (SBMicro), Natal; 2009-08-31 - 2009-09-03; in "ECS Transactions", (2009), ISBN: 978-1-56677-737-7, 61 - 68. BibTeX |
| 3. | O. Ertl, S. Selberherr: "Three-Dimensional Topography Simulation Using Advanced Level Set and Ray Tracing Methods"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Hakone, Japan; 2008-09-09 - 2008-09-11; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2008), ISBN: 978-1-4244-1753-7, 325 - 328 doi:10.1109/SISPAD.2008.4648303. BibTeX |
| 2. | J. Cervenka, H. Ceric, O. Ertl, S. Selberherr: "Three-Dimensional Sacrificial Etching"; Poster: T. Grasser, S. Selberherr (ed); International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Vienna, Austria; 2007-09-25 - 2007-09-27; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2007), 12, ISBN: 978-3-211-72860-4, 433 - 436 doi:10.1007/978-3-211-72861-1_105. BibTeX |
| 1. | O. Ertl, C. Heitzinger, S. Selberherr: "Efficient Coupling of Monte Carlo and Level Set Methods for Topography Simulation"; Poster: T. Grasser, S. Selberherr (ed); International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Vienna, Austria; 2007-09-25 - 2007-09-27; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2007), 12, ISBN: 978-3-211-72860-4, 417 - 420 doi:10.1007/978-3-211-72861-1_101. BibTeX |
| 1. | O. Ertl: "Numerical Methods for Topography Simulation"; Reviewer: S. Selberherr, D. Süss; Institut für Mikroelektronik, 2010, oral examination: 2010-05-07. BibTeX |
| 2. | O. Baumgartner, O. Ertl, R. Orio, P.-J. Wagner, T. Windbacher, S. Selberherr: "VISTA Status Report II"; (2009), 35 page(s) . BibTeX |
| 1. | O. Baumgartner, O. Ertl, W. Gös, F. Stimpfl, T. Windbacher, S. Selberherr: "VISTA Status Report II"; (2008), 28 page(s) . BibTeX |