Publications Heinrich Kirchauer

14 records

Publications in Scientific Journals

4.  W. Pyka, H. Kirchauer, S. Selberherr:
"Three-Dimensional Resist Development Simulation - Benchmarks and Integration with Lithography";
Microelectronic Engineering, 53 (2000), 1-4; 449 - 452. https://doi.org/10.1016/S0167-9317(00)00353-1

3.  H. Kirchauer, S. Selberherr:
"Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination";
Proceedings of SPIE, 3334 (1998), 764 - 776. https://doi.org/10.1117/12.310809

2.  H. Kirchauer, S. Selberherr:
"Rigorous Three-Dimensional Photoresist Exposure and Development Simulation over Nonplanar Topography";
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 16 (1997), 12; 1431 - 1438. https://doi.org/10.1109/43.664225

1.  H. Kirchauer, S. Selberherr:
"Three-Dimensional Photolithography Simulation";
IEEE Journal of Technology Computer Aided Design, 1 (1997), 6; 1 - 37. https://doi.org/10.1109/TCAD.1996.6449163

Talks and Poster Presentations (with Proceedings-Entry)

6.  W. Pyka, H. Kirchauer, S. Selberherr:
"Three-Dimensional Resist Development Simulation - Benchmarks and Integration with Lithography";
Talk: Micro- and Nano-Engineering Conference, Rom; 1999-09-21 - 1999-09-23; in: "Abstracts Micro-and-Nano-Engineering 99 Conf.", (1999), 305 - 306.

5.  H. Kirchauer, S. Selberherr:
"A Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination";
Poster: SPIE Optical Microlithography, Santa Clara, CA, USA; 1998-02-22 - 1998-02-27; in: "Proceedings of SPIE Optical Microlithography", (1998), 3334·86.

4.  H. Kirchauer, S. Selberherr:
"Three-Dimensional Photolithography Simulation";
Talk: Grundlagen und Technologie elektronischer Bauelemente, Großarl; 1997-03-19 - 1997-03-22; in: "Proceedings Seminar Basics and Technology of Electronic Devices", (1997), ISBN: 3-901578-02-1; 27 - 31.

3.  H. Kirchauer, S. Selberherr:
"Rigorous Three-Dimensional Photolithography Simulation Over Nonplanar Structures";
Talk: European Solid-State Device Research Conference (ESSDERC), Bologna; 1996-09-09 - 1996-09-11; in: "Proceedings of the European Solid-State Device Research Conference (ESSDERC)", (1996), ISBN: 2-86332-196-x; 347 - 350.

2.  H. Kirchauer, S. Selberherr:
"Three-Dimensional Photoresist Exposure and Development Simulation";
Poster: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Tokyo, Japan; 1996-09-02 - 1996-09-04; in: "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (1996), ISBN: 0-7803-2745-4; 99 - 100. https://doi.org/10.1109/SISPAD.1996.865291

1.  H. Kirchauer, S. Selberherr:
"Three-Dimensional Simulation of Light-Scattering over Nonplanar Substrates in Photolithography";
Poster: Electron, Ion and Photon Beam Technology and Nanofabrication Conference, Atlanta; 1996-05-28 - 1996-05-31; in: "Abstracts Electron, Ion and Photon Beam Technology and Nanofabrication Conference", (1996), 155 - 156.

Doctor's Theses (authored and supervised)

1.  H. Kirchauer:
"Photolithography Simulation";
Supervisor, Reviewer: S. Selberherr, W. Fallmann; Institut für Mikroelektronik, 1998; oral examination: 1998-04-21.

Diploma and Master Theses (authored and supervised)

1.  H. Kirchauer:
"Optimal Filters for Signal Enhancement: Time-Frequency Analysis and Design";
Supervisor: W.F.G. Mecklenbräuker, F. Hlawatsch; Institut für Nachrichtentechnik und Informationstechnik, 1994.

Scientific Reports

2.  T. Grasser, A. Hössinger, H. Kirchauer, M. Knaipp, R. Martins, R. Plasun, M. Rottinger, G. Schrom, S. Selberherr:
"VISTA Status Report December 1997";
1997; 36 pages.

1.  H. Kirchauer, R. Plasun, M. Radi, S. Selberherr, R. Strasser:
"VISTA Status Report December 1996";
1996; 30 pages.