Publications Heinrich Kirchauer
14 records
| 4. | W. Pyka, H. Kirchauer, S. Selberherr: "Three-Dimensional Resist Development Simulation - Benchmarks and Integration with Lithography"; Microelectronic Engineering, 53, (2000), 449 - 452 doi:10.1016/S0167-9317(00)00353-1. BibTeX |
| 3. | H. Kirchauer, S. Selberherr: "Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination"; Proceedings of SPIE, 3334, (1998), 764 - 776 doi:10.1117/12.310809. BibTeX |
| 2. | H. Kirchauer, S. Selberherr: "Rigorous Three-Dimensional Photoresist Exposure and Development Simulation over Nonplanar Topography"; IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 16, (1997), 1431 - 1438 doi:10.1109/43.664225. BibTeX |
| 1. | H. Kirchauer, S. Selberherr: "Three-Dimensional Photolithography Simulation"; IEEE Journal of Technology Computer Aided Design, 1, (1997), doi:10.1109/TCAD.1996.6449163. BibTeX |
| 6. | W. Pyka, H. Kirchauer, S. Selberherr: "Three-Dimensional Resist Development Simulation - Benchmarks and Integration with Lithography"; Talk: Micro- and Nano-Engineering Conference, Rom; 1999-09-21 - 1999-09-23; in "Abstracts Micro-and-Nano-Engineering 99 Conf.", (1999), 305 - 306. BibTeX |
| 5. | H. Kirchauer, S. Selberherr: "A Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination"; Poster: SPIE Optical Microlithography, Santa Clara, CA, USA; 1998-02-22 - 1998-02-27; in "Proceedings of SPIE Optical Microlithography", (1998), 3334·86. BibTeX |
| 4. | H. Kirchauer, S. Selberherr: "Three-Dimensional Photolithography Simulation"; Talk: Grundlagen und Technologie elektronischer Bauelemente, Großarl; 1997-03-19 - 1997-03-22; in "Proceedings Seminar Basics and Technology of Electronic Devices", (1997), ISBN: 3-901578-02-1, 27 - 31. BibTeX |
| 3. | H. Kirchauer, S. Selberherr: "Rigorous Three-Dimensional Photolithography Simulation Over Nonplanar Structures"; Talk: European Solid-State Device Research Conference (ESSDERC), Bologna; 1996-09-09 - 1996-09-11; in "Proceedings of the European Solid-State Device Research Conference (ESSDERC)", (1996), ISBN: 2-86332-196-x, 347 - 350. BibTeX |
| 2. | H. Kirchauer, S. Selberherr: "Three-Dimensional Photoresist Exposure and Development Simulation"; Poster: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Tokyo, Japan; 1996-09-02 - 1996-09-04; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (1996), ISBN: 0-7803-2745-4, 99 - 100 doi:10.1109/SISPAD.1996.865291. BibTeX |
| 1. | H. Kirchauer, S. Selberherr: "Three-Dimensional Simulation of Light-Scattering over Nonplanar Substrates in Photolithography"; Poster: Electron, Ion and Photon Beam Technology and Nanofabrication Conference, Atlanta; 1996-05-28 - 1996-05-31; in "Abstracts Electron, Ion and Photon Beam Technology and Nanofabrication Conference", (1996), 155 - 156. BibTeX |
| 1. | H. Kirchauer: "Photolithography Simulation"; Reviewer: S. Selberherr, W. Fallmann; Institut für Mikroelektronik, 1998, oral examination: 1998-04-21. BibTeX |
| 1. | H. Kirchauer: "Optimal Filters for Signal Enhancement: Time-Frequency Analysis and Design"; Supervisor: W.F.G. Mecklenbräuker, F. Hlawatsch; Institut für Nachrichtentechnik und Informationstechnik, 1994, . BibTeX |
| 2. | T. Grasser, A. Hössinger, H. Kirchauer, M. Knaipp, R. Martins, R. Plasun, M. Rottinger, G. Schrom, S. Selberherr: "VISTA Status Report II"; (1997), 36 page(s) . BibTeX |
| 1. | H. Kirchauer, R. Plasun, M. Radi, S. Selberherr, R. Strasser: "VISTA Status Report II"; (1996), 30 page(s) . BibTeX |