Publications Xaver Klemenschits
17 records
| 4. | T. Reiter, X. Klemenschits, L. Filipovic: "Impact of Plasma Induced Damage on the Fabrication of 3D NAND Flash Memory"; Solid-State Electronics, 192, (invited) (2022), 108261-1 - 108261-9 doi:10.1016/j.sse.2022.108261. BibTeX |
| 3. | X. Klemenschits, S. Selberherr, L. Filipovic: "Geometric Advection and Its Application in the Emulation of High Aspect Ratio Structures"; Computer Methods in Applied Mechanics and Engineering, 386, (2021), 114196-1 - 114196-22 doi:10.1016/j.cma.2021.114196. BibTeX |
| 2. | A. Toifl, M. Quell, X. Klemenschits, P. Manstetten, A. Hössinger, S. Selberherr, J. Weinbub: "The Level-Set Method for Multi-Material Wet Etching and Non-Planar Selective Epitaxy"; IEEE Access, 8, (2020), 115406 - 115422 doi:10.1109/ACCESS.2020.3004136. BibTeX |
| 1. | X. Klemenschits, S. Selberherr, L. Filipovic: "Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review"; Micromachines, 9, (invited) (2018), 631-1 - 631-31 doi:10.3390/mi9120631. BibTeX |
| 3. | T. Reiter, X. Klemenschits, L. Filipovic: "Impact of High-Aspect-Ratio Etching Damage on Selective Epitaxial Silicon Growth in 3D NAND Flash Memory"; in "Proceedings of the 2021 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)", B. Cretu (ed); IEEE, 2021, ISBN: 978-1-6654-3745-5, 1 - 4 doi:10.1109/EuroSOI-ULIS53016.2021.9560693. BibTeX |
| 2. | X. Klemenschits, S. Selberherr, L. Filipovic: "Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review"; in "Miniaturized Transistors", L. Filipovic, T. Grasser (ed); MDPI, (invited) 2019, ISBN: 978-3-03921-010-7, 105 - 135 doi:10.3390/books978-3-03921-011-4. BibTeX |
| 1. | X. Klemenschits, S. Selberherr, L. Filipovic: "Unified Feature Scale Model for Etching in SF6 and Cl Plasma Chemistries"; in "Proceedings of the 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)", F. Gamiz, V. Sverdlov, C. Sampedro, L. Donetti (ed); IEEE, 2018, ISBN: 978-1-5386-4812-4, 177 - 180 doi:10.1109/ULIS.2018.8354763. BibTeX |
| 9. | J. Bobinac, T. Reiter, J. Piso, X. Klemenschits, O. Baumgartner, Z. Stanojevic, G. Strof, M. Karner, L. Filipovic: "Impact of Mask Tapering on SF6/O2 Plasma Etching"; Talk: Fourth International Conference on Microelectronic Devices and Technologies (MicDAT '2022), Corfu, Greece; 2022-09-21 - 2022-09-23; in "Microelectronic Devices and Technologies: Proceedings of the 4rd International Conference on Microelectronic Devices and Technologies (MicDAT '2022)", (2022), ISBN: 978-84-09-43856-3, 90 - 94. BibTeX |
| 8. | L.F. Aguinsky, F. Rodrigues, X. Klemenschits, L. Filipovic, A. Hössinger, J. Weinbub: "Modeling Non-Ideal Conformality during Atomic Layer Deposition in High Aspect Ratio Structures"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2022), Granada, Spain; 2022-09-06 - 2022-09-08; in "SISPAD 2022: International Conference on Simulation of Semiconductor Processes and Devices - Conference Abstract Booklet", (2022), 40 - 41. BibTeX |
| 7. | L. Filipovic, X. Klemenschits: "Fast Model for Deposition in Trenches using Geometric Advection"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Dallas, Texas (USA); 2021-09-27 - 2021-09-29; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2021), 224 - 228 doi:10.1109/SISPAD54002.2021.9592595. BibTeX |
| 6. | X. Klemenschits, S. Selberherr, L. Filipovic: "Combined Process Simulation and Emulation of an SRAM Cell of the 5nm Technology Node"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Dallas, Texas (USA); 2021-09-27 - 2021-09-29; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2021), 23 - 27 doi:10.1109/SISPAD54002.2021.9592605. BibTeX |
| 5. | T. Reiter, X. Klemenschits, L. Filipovic: "Impact of High-Aspect-Ratio Etching Damage on Selective Epitaxial Silicon Growth in 3D NAND Flash Memory"; Poster: Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Caen, France; 2021-09-01 - 2021-09-03; in "Book of Abstracts of the Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)", (2021), 34 - 35. BibTeX |
| 4. | X. Klemenschits, S. Selberherr, L. Filipovic: "Geometric Advection Algorithm for Process Emulation"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Kobe, Japan - virtual; 2020-09-23 - 2020-10-06; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2020), 59 - 62 doi:10.23919/SISPAD49475.2020.9241678. BibTeX |
| 3. | X. Klemenschits, P. Manstetten, L. Filipovic, S. Selberherr: "Process Simulation in the Browser: Porting ViennaTS using WebAssembly"; Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), Udine, Italy; 2019-09-04 - 2019-09-06; in "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)", (2019), ISBN: 978-1-7281-0938-1, 339 - 342 doi:10.1109/SISPAD.2019.8870374. BibTeX |
| 2. | X. Klemenschits, S. Selberherr, L. Filipovic: "Fast Volume Evaluation on Sparse Level Sets"; Poster: International Workshop on Computational Nanotechnology (IWCN), Chicago, IL, USA; 2019-05-20 - 2019-05-24; in "Book of Abstracts of the International Workshop on Computational Nanotechnology (IWCN)", (2019), ISBN: 978-3-9504738-0-3, 113 - 114. BibTeX |
| 1. | X. Klemenschits, S. Selberherr, L. Filipovic: "Unified Feature Scale Model for Etching in SF6 and Cl Plasma Chemistries"; Poster: Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Granada, Spain; 2018-03-19 - 2018-03-21; in "Book of Abstracts of the Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)", (2018), ISBN: 978-1-5386-4810-0, 65 - 66. BibTeX |
| 1. | X. Klemenschits: "Emulation and Simulation of Microelectronic Fabrication Processes"; Reviewer: L. Filipovic, A. Erdmann, H. Pottmann; Institut für Mikroelektronik, 2022, oral examination: 2022-04-08. BibTeX |