|Worked for IµE from 01-07-1990 to 31-12-1993.|
|Biography (as of 31-12-1993):|
Hannes Stippel was born in Vienna, Austria, in 1966. During his study at the Technische Universität Wien he held various vacation jobs at local companies. He also worked as a teaching assistant at the Institut für Hochbau für Architekten. He received the degree of Diplomingenieur in electrical engineering from the Technische Universität Wien in 1990. In July 1990 he joined the Institute for Microelectronics. In the summer of 1992 he held a visiting research position at National Semiconductor Corporation, Santa Clara, California, USA. Presently he is working towards his doctoral degree. His work is focused on the simulation of ion implantation in arbitrary three-dimensional structures by using the Monte Carlo method.