Publications Hannes Stippel
15 records
| 1. | S. Selberherr, H. Stippel, R. Strasser: "Simulation of Semiconductor Devices and Processes, Vol.5"; Springer-Verlag, Wien - New York, (1993), ISBN: 978-3-7091-7372-5, 504 page(s) doi:10.1007/978-3-7091-6657-4. BibTeX |
| 3. | S. Halama, F. Fasching, C. Fischer, H. Kosina, E. Leitner, P. Lindorfer, C. Pichler, H. Pimingstorfer, H. Puchner, G. Rieger, G. Schrom, T. Simlinger, M. Stiftinger, H. Stippel, E. Strasser, W. Tuppa, K. Wimmer, S. Selberherr: "The Viennese Integrated System for Technology CAD Applications"; Microelectronics Journal, 26, (1995), 137 - 158 doi:10.1016/0026-2692(95)98918-H. BibTeX |
| 2. | H. Stippel, E. Leitner, C. Pichler, H. Puchner, E. Strasser, S. Selberherr: "Process Simulation for the 1990s"; Microelectronics Journal, 26, (invited) (1995), 203 - 215 doi:10.1016/0026-2692(95)98922-E. BibTeX |
| 1. | H. Stippel, S. Selberherr: "Monte Carlo Simulation of Ion Implantation for Three-Dimensional Structures Using an Octree"; IEICE Transactions on Electronics, E77-C, (1994), 118 - 123. BibTeX |
| 9. | S. Halama, F. Fasching, C. Fischer, H. Kosina, E. Leitner, C. Pichler, H. Pimingstorfer, H. Puchner, G. Rieger, G. Schrom, T. Simlinger, M. Stiftinger, H. Stippel, E. Strasser, W. Tuppa, K. Wimmer, S. Selberherr: "The Viennese Integrated System for Technology CAD Applications"; Talk: Workshop on Technology CAD Systems, Wien; (invited) 1993-09-06 in "Proceedings Technology CAD Systems Workshop", (1993), ISBN: 3-211-82505-3, 197 - 236 doi:10.1007/978-3-7091-9315-0_10. BibTeX |
| 8. | H. Stippel, S. Selberherr: "Three Dimensional Monte Carlo Simulation of Ion Implantation with Octree Based Point Location"; Poster: VLSI Process and Device Modeling Workshop (VPAD), Nara; 1993-05-14 - 1993-05-15; in "Proceedings VPAD Workshop", (1993), ISBN: 0-7803-1338-0, 122 - 123. BibTeX |
| 7. | H. Stippel, G. Hobler, S. Selberherr: "Three-Dimensional Simulation of Ion Implantation"; Talk: International Conference on Solid State and Integrated Circuit Technology (ICSICT), Peking; 1992-10-18 - 1992-10-24; in "Proceedings Solid State and Integrated Circuit Technology 92 Conference", (1992), 703 - 705. BibTeX |
| 6. | H. Stippel, F. Fasching, C. Fischer, S. Halama, H. Pimingstorfer, W. Tuppa, K. Wimmer, S. Selberherr: "Implementation of a TCAD Framework"; Talk: European Simulation Multiconference (ESM), York; 1992-06-01 - 1992-06-03; in "Proceedings European Simulation Multiconference", (1992), ISBN: 1-56555-013-7, 131 - 135. BibTeX |
| 5. | H. Stippel, S. Halama, G. Hobler, K. Wimmer, S. Selberherr: "Adaptive Grid for Monte Carlo Simulation of Ion Implantation"; Talk: International Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits (NUPAD), Seattle; 1992-05-31 - 1992-06-01; in "Proceedings NUPAD IV", (1992), ISBN: 0-7803-0516-7, 231 - 236. BibTeX |
| 4. | F. Fasching, C. Fischer, S. Halama, H. Pimingstorfer, H. Read, S. Selberherr, H. Stippel, W. Tuppa, P. Verhas, K. Wimmer: "A New Open Technology CAD System"; Talk: European Solid-State Device Research Conference (ESSDERC), Montreux; 1991-09-16 - 1991-09-19; in "Proceedings of the European Solid-State Device Research Conference (ESSDERC)", (1991), ISBN: 0-444-89066-1, 217 - 220 doi:10.1016/0167-9317(91)90216-Z. BibTeX |
| 3. | F. Fasching, C. Fischer, S. Selberherr, H. Stippel, W. Tuppa, H. Read: "A PIF Implementation for TCAD Purposes"; Talk: International Conference on the Simulation of Semiconductor Devices and Processes (SISDEP), Zürich; 1991-09-12 - 1991-09-14; in "Proceedings SISDEP 91", (1991), ISBN: 3-89191-476-8, 477 - 482. BibTeX |
| 2. | S. Selberherr, C. Fischer, S. Halama, H. Pimingstorfer, H. Read, H. Stippel, P. Verhas, K. Wimmer: "The Viennese TCAD System"; Talk: VLSI Process and Device Modeling Workshop (VPAD), Oiso; (invited) 1991-05-26 - 1991-05-27; in "Proceedings VPAD Workshop", (1991), 32 - 35. BibTeX |
| 1. | F. Fasching, C. Fischer, S. Halama, H. Pimingstorfer, H. Read, S. Selberherr, H. Stippel, P. Verhas, K. Wimmer: "An Integrated Technology CAD Environment"; Talk: VLSI Technology, Systems and Applications Symposium (VLSITSA), Taipeh; 1991-05-22 - 1991-05-24; in "Proceedings VLSI Technology, Systems and Applications Symposium", (1991), ISBN: 0-7803-0036-x, 147 - 151. BibTeX |
| 1. | H. Stippel: "Simulation der Ionen-Implantation"; Reviewer: S. Selberherr, W. Fallmann; Institut für Mikroelektronik, 1993, oral examination: 1993-11-17. BibTeX |
| 1. | S. Halama, C. Pichler, G. Rieger, S. Selberherr, T. Simlinger, H. Stippel, E. Strasser: "VISTA Status Report II"; (1993), 19 page(s) . BibTeX |