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4. Characterization of Interfaces

THE excellent quality of the \ensuremath {\textrm {Si/SiO$_2$}} interface is one of the main reasons for the success of the modern VLSI MOS technology. Therefore, it is very important to characterize the quality of this interface as precisely as possible.


Subsections
next up previous contents
Next: 4.1 Charge Pumping Method Up: Dissertation Robert Entner Previous: 3.2 Centers
R. Entner: Modeling and Simulation of Negative Bias Temperature Instability