 | … | Amorphous silicon dioxide |
| CDW | … | Coupled double well |
 | … | Crystalline silicon dioxide |
| DFT | … | Density functional theory |
| ESR | … | Electron spin resonance |
| ETM | … | Elastic tunneling model |
 | … | Hydrogen |
| HDL | … | Harry-Diamond-Laboratories |
| LSM | … | Level shift model |
| MPFAT | … | Multiphonon field assisted tunneling |
| MOSFET | … | Metal oxide semiconductor field effect transistor |
| MSM | … | Measure-stress-measure |
| NBTI | … | Negative bias temperature instability |
| NMP | … | Nonradiative multi-phonon (process) |
 | … | Oxygen |
| OTF | … | On-the-fly |
| RD | … | Reaction diffusion |
| RDD | … | Reaction dispersive diffusion |
| RTN | … | Random telegraph noise |
 | … | Silicon |
 | … | Silicon dioxide |
 | … | Silicon Oxynitride |
| SRH | … | Shockley-Read-Hall |
| TDDS | … | Time-dependent defect spectroscopy |
| TSM | … | Two stage model |
| TWM | … | Triple well model |
| WKB | … | Wenzel-Kramers-Brillouin |
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