next up previous contents
Next: Curriculum Vitae Up: PhD Thesis Heinrich Kirchauer Previous: Bibliography

List of Publications

P12
H. Kirchauer and S. Selberherr.
Rigorous Three-Dimensional Photoresist Exposure and Development Simulation over Nonplanar Topography.
To appear in IEEE Trans.Computer-Aided Design, 16(12), December 1998.

P11
H. Kirchauer and S. Selberherr.
A Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination.
In Proc.SPIE Optical/Laser Microlithography XI, vol. 3334, Santa Clara, CA, March 1998.

P10
E. Leitner, H. Kirchauer, S. Selberherr, H. Puchner, and S. Aronowitz.
Simulation of {311} Defect Behavior and the Impact on Phosphorus Diffusion.
Submitted to IEEE Trans.Electron Devices, November 1997.

P9
H. Kirchauer and S. Selberherr.
Three-Dimensional Photolithography Simulation.
IEEE Trans.Semicond.Technol. Modeling and Simulation, no. 6, June 1997.

http://www.ieee.org/journal/tcad/accepted/kirchauer-jun97/.

P8
H. Kirchauer and S. Selberherr.
Three-Dimensional Photolithography Simulation.
In Proc. Seminar ``Basics and Technology of Electronic Devices'', pp. 27-31, Technical University Vienna, Vienna, Austria, March 1997.

P7
F. Hlawatsch, G. Matz, H. Kirchauer, and W. Kozek.
Time-Frequency Formulation and Design of Time-Varying Optimal Filters.
Submitted to IEEE Trans.Signal Processing, January 1997.

P6
H. Kirchauer and S. Selberherr.
Three-Dimensional Photoresist Exposure and Development Simulation.
In Proc.SISPAD'96--1996 International Conference on Simulation of Semiconductor Processes and Devices, pp. 99-100, Tokyo, Japan, September 1996.

P5
H. Kirchauer and S. Selberherr.
Rigorous Three-Dimensional Photolithography Simulation Over Nonplanar Structures.
In Proc.ESSDERC'96--26 $^{\mathit{th}}$ European Solid State Device Research Conference, pp. 347-350, Bologna, Italy, September 1996.

P4
H. Kirchauer and S. Selberherr.
Three-Dimensional Simulation of Light-Scattering Over Nonplanar Substrates in Photolithography.
In EIPBN'96--40 $^{\mathit{th}}$ International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Abstracts, pp. 155-156, Atlanta, GA, May 1996.

P3
H. Kirchauer, F. Hlawatsch, and W. Kozek.
Time-Frequency Formulation and Design of Nonstationary Wiener Filters.
In Proc.ICASSP'95--IEEE Int.Conf.Acoust., Speech, Signal Processing, pp. 1549-1552, Detroit, MI, May 1995.

P2
W. Kozek, F. Hlawatsch, H. Kirchauer, and U. Trautwein.
Correlative Time-Frequency Analysis and Classification of Nonstationary Random Processes.
In Proc.IEEE Int.Symp. ``Time-Frequency and Time-Scale Analysis'', pp. 417-420, Philadelphia, PA, October 1994.

P1
H. Kirchauer.
Optimalfilter zur Signalentstörung: Zeit-Frequenz-Analyse und -Entwurf.
Master's thesis, Technical University Vienna, Vienna, Austria, March 1994.


Heinrich Kirchauer, Institute for Microelectronics, TU Vienna
1998-04-17