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2.3 Comparison Analytical - Monte Carlo Simulation Method

  The decision, whether to use the Monte Carlo simulation method or the analytical ion implantation method, is a trade-off between CPU time consumption and accuracy. The results obtained from Monte Carlo calculations are based on probability decisions, hence the accuracy is limited within two or three orders of magnitudes. The analytical method allows a more realistic dopant profile description over the whole concentration range, but it cannot cover physical effects like reflection of particles at the simulation boundaries. Figure 2.3-1 shows the two-dimensional result of a phosphorus implantation at 70keV and 30 degrees tilt angle. Comparing our analytical results with Monte Carlo simulations (see Fig. 2.3-2) we found good agreement. Due to the neglection of the reflected particles in the mask sidewall region, the analytical method yields a lower peak concentration in the silicon substrate. One major drawback of the Monte Carlo ion implantation method is the enormous CPU time consumption for amorphous and even for crystalline calculations. For a simple structure like that shown in Figure 2.3-1 a two-dimensional crystalline Monte Carlo simulation would consume approximately tex2html_wrap_inline4985 times the CPU time of the analytical method. By performing a two-dimensional amorphous Monte Carlo simulation this CPU time ratio is reduced by one magnitude ( tex2html_wrap_inline4987 ). Therefore, the Monte Carlo method is not suitable for optimization purposes, where several hundred implantations have to be simulated within reasonable time.

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Figure 2.3-1: Two-dimensional phosphorus implantation profile obtained by the analytical ion implantation method at 70 keV energy, tex2html_wrap_inline4991 dose, and tex2html_wrap_inline4993 tilt angle. Due to neglection of reflective particles the sidewall mask concentration is underestimated.
Figure 2.3-2: Two-dimensional phosphorus implantation profile obtained from the amorphous Monte Carlo ion implantation method at 70 keV energy, tex2html_wrap_inline4991 dose, and tex2html_wrap_inline4993 tilt angle. The simulation was performed using 50.000 distinct ions and consumed about 90 times the CPU time of the analytical simulation method.


next up previous contents
Next: 3 The Diffusion Process Up: 2 Analytical Ion Implantation Previous: 2.2.2 Convolution Method

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