, , | Diameters of the structuring element |

, , | Bleachable absorption coefficients of Dill's `ABC'-model |

, | Reaction rate constants |

Concentration of species | |

Geometric complexity exponent | |

Averaging distance for calculating surface normals | |

Particle diameter | |

Diffusion coefficient of species | |

Ion enhancement factor | |

Activation energy | |

Complex-valued phasor of time-harmonic electric field | |

Angular distribution functions | |

Angular distribution function for off center position | |

Complex-valued phasor of time-harmonic magnetic field | |

Electrical current | |

Intensity distribution | |

Boltzmann number, 1.381J/K | |

Characteristic parameter of lithography processes | |

Knudsen number | |

Mean free path | |

Fitting paramter for particle distribution | |

Magnitude of electrical field component | |

Number of cells in one dimension | |

Refractive Index | |

Complex-valued refractive index | |

Fraction of convex corner surface cells | |

Normalizing factor for distribution functions | |

Numerical aperture of a lens or a lens system | |

Pressure | |

Phase of electrical field component | |

Local etch or deposition rate | |

Rate resolved by cells size | |

Nominal etch or deposition rate for flat wafer | |

Etch or deposition contribution from directly incident particles | |

Gas constant | |

, | Homogeneous and heterogeneous reaction rate |

Angular dependent etching yield | |

Etching yield for normal incidence | |

Time | |

Time-step | |

Temperature | |

Reflection transformation matrix | |

Voltage | |

Lithographic resolution | |

Position along x-, y-, and z-axis | |

Differerence in position in x-, y-, and z-Axis | |

Angle | |

Angular step width | |

Reciprocal relative permittivity | |

Energy | |

Permittivity | |

Vacuum permittivity | |

Free-space resistance | |

Light sensitive photoresist compound | |

Azimuthal angle | |

Azimuthal direction of the sputter target center | |

Dielectric constant | |

Actinic wavelength | |

Vacuum permeability | |

Angular frequency | |

Solid angle | |

Visibility function | |

Complementary visibility function | |

Polar angle | |

Polar direction of the sputter target center | |

Sticking coefficient | |

Standard deviation |

W. Pyka: Feature Scale Modeling for Etching and Deposition Processes in Semiconductor Manufacturing