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List of Symbols

$a$, $b$, $c$	Diameters of the structuring element
$A$, $B$, $C$	Bleachable absorption coefficients of Dill's `ABC'-model
$c_1$, $c_2$	Reaction rate constants
$c_i$	Concentration of species $i$
$c_x$	Geometric complexity exponent
$d$	Averaging distance for calculating surface normals
$d_p$	Particle diameter
$D_i$	Diffusion coefficient of species $i$
$\mathrm{E}$	Ion enhancement factor
${E_A}$	Activation energy
$\mathbf{E}(\mathbf{x})$	Complex-valued phasor of time-harmonic electric field
$\mathrm{F}(\varphi, \vartheta), \mathrm{F'}(\varphi, \vartheta)$	Angular distribution functions
$\mathrm{F_{\!off}}(\varphi, \vartheta)$	Angular distribution function for off center position
$\mathbf{H}(\mathbf{x})$	Complex-valued phasor of time-harmonic magnetic field
$I$	Electrical current
$I(\mathbf{x};t)$	Intensity distribution
$k$	Boltzmann number, 1.381$10^{-23}$J/K
$k_0$	Characteristic parameter of lithography processes
$K_n$	Knudsen number
$\bar{l}$	Mean free path
$m$	Fitting paramter for particle distribution
$\mathrm{Mag}$	Magnitude of electrical field component
$n$	Number of cells in one dimension
$n_0$	Refractive Index
$n(\mathbf{x};t)$	Complex-valued refractive index
$n_x$	Fraction of convex corner surface cells
$\mathrm{N}$	Normalizing factor for distribution functions
$\mathit{NA}$	Numerical aperture of a lens or a lens system
$p$	Pressure
$\mathrm{Pha}$	Phase of electrical field component
$r$	Local etch or deposition rate
$r_n$	Rate resolved by cells size
$r_0$	Nominal etch or deposition rate for flat wafer
$r_\mathrm{direct}$	Etch or deposition contribution from directly incident particles
$R$	Gas constant
$R^{\mathrm{hom}}$, $R^{\mathrm{het}}$	Homogeneous and heterogeneous reaction rate
$\mathrm{S}(\alpha)$	Angular dependent etching yield
$\mathrm{S}_0$	Etching yield for normal incidence
$t$	Time
$\Delta t$	Time-step
$T$	Temperature
$T_{ij}$	Reflection transformation matrix
$V$	Voltage
$W$	Lithographic resolution
$x, y, z$	Position along x-, y-, and z-axis
$\Delta x, \Delta y, \Delta z$	Differerence in position in x-, y-, and z-Axis
$\alpha$	Angle
$\Delta\alpha$	Angular step width
$\chi$	Reciprocal relative permittivity
$\epsilon$	Energy
$\varepsilon$	Permittivity
$\varepsilon _0$	Vacuum permittivity
$\eta_0$	Free-space resistance
$\gamma(\mathbf{x};t)$	Light sensitive photoresist compound
$\vartheta, \vartheta'$	Azimuthal angle
$\vartheta_{\mathrm{src}}$	Azimuthal direction of the sputter target center
$\kappa$	Dielectric constant
$\lambda$	Actinic wavelength
$\mu_0$	Vacuum permeability
$\omega$	Angular frequency
$\Omega$	Solid angle
$\Omega(\varphi, \vartheta)$	Visibility function
$\Omega^\mathrm{c}(\varphi, \vartheta)$	Complementary visibility function
$\varphi, \varphi'$	Polar angle
$\varphi_{\mathrm{src}}$	Polar direction of the sputter target center
$\sigma$	Sticking coefficient
$\sigma_s$	Standard deviation

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