List of Tables

• 3.1 Summary of lithography simulators
• 4.1 Seidel aberrations described by power series
• 4.2 Radial polynomials for low order indices
• 4.3 Imaging consequences of the first 11 Zernike polynomials
• 5.1 Comparison of simulation techniques of topography scattering
• 6.1 Quantities used in the differential method
• 6.2 Algorithm for single shooting
• 6.3 Algorithm for shooting with reduced superposition
• 6.4 Algorithm for stabilized march technique
• 6.5 Numerical costs of the stabilized march algorithm
• 7.1 Post-exposure bake parameters for the IBM APEX-E resist
• 8.1 Performance figures of large area aerial image simulation
• 8.2 Contact hole diameters at the substrate surface