The temperature distribution defined by (4.6)-(4.8) is used to set up the mechanical problem and the required equation for stress development due to thermal expansion is,
The strain tensor is connected to the local displacements
through relations,
Replacing (4.9) and (4.10) into (4.11) one obtains an equation system for unknown local displacement functions
.
Equations (4.6)-(4.8) and (4.9)-(4.11) model time dependently the evolution of stress in the interconnect structures.
These equations are solved by means of the finite element method [76,11]. After determining local displacement functions
, the stress tensor is calculated using relations (4.9) and (4.10).
Depending on the interconnect layout, electro-thermal stresses can have tensile or compressive nature. High tensile stresses can cause break-up of the material and delopement of voids, on the other hand compressive stresses induce generation of extrusions.