6.3 Atomic Force Microscope Lithography

AFM nanolithography is an emerging processing technique which can be utilized for many different applications. As mentioned in Chapter 5, a MC technique is combined with the LS method in order to simulate nanodots and nanowires with a topography which follows nanodots and nanowires generated with an AFM on a silicon surface. In this section, the AFM lithography technique will be utilized to generate nanodots and nanowires under various ambient conditions. The application of nanodots to generate ROM dots will also be shown, in addition to the generation of nanowires in order to design a junctionless transistor.


L. Filipovic: Topography Simulation of Novel Processing Techniques