6. Applications

In this chapter the previously described processing techniques are simulated in the LS environment. The models implemented are described in Chapter 5. This chapter also addresses how the various processing techniques can be utilized in order to fabricate modern devices. The main technologies which will be considered are silicon oxidation, AFM nanolithography, spray pyrolysis deposition, and the etching of BiCS memory holes.


L. Filipovic: Topography Simulation of Novel Processing Techniques