Processes at the Falling Edge:



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Processes at the Falling Edge:

So far we have considered the gate pulses with abrupt edges. When the falling edge has a nonvanishing width a part of electrons captured at the top level is emitted at the falling edge before the hole capture occurs. These electrons are emitted into the conduction band. They are collected by the junctions and do not contribute to the charge-pumping current. We assume that the non-steady-state electron emission begins at the gate bias and stops when the hole capture becomes dominant at the gate level . The level specifies the transition between the steady-state and the non-steady-state emission mode and is given by equaling the rates of changes in the trap occupancy function in these emission modes, as is explained latter. has been calculated for different fall times in [97]. It is usually assumed in the literature that the level corresponds approximately to the device flat-band potential . In the next section we will show, when comparing the analytical and the numerical results, that this assumption is only a very rough approximation. The difference remarkably increases with steepness of the gate-pulse falling edges. In a very rough approximation corresponds to the device threshold voltage. Note that the levels and differ from and introduced above.
We adopt a step approximation of the non-steady-state occupancy function assuming that all traps between and some emission level emit electrons, while the traps bellow the level do not emit at the falling edge. After [154][97]

 

where is the time of the non-steady-state electron emission and is the emission level at the onset of the non-steady-state emission. This expression can be reduced to

 

where and is the surface electron concentration which corresponds to the energy level at the onset of the non-steady-state emission. The onset level we set to be

 

When the gate top level is higher than the gate bias which corresponds to the onset of the non-steady-state emission, the electron emission occurs in the steady-state mode at first. The non-steady-state mode begins at the level , in a step approximation. If the gate top bias lies below the traps emit immediately in the non-steady-state mode when the gate bias begins to fall and the onset of the non-steady-state emission is given by the level .
To calculate the level we follow the approach proposed in the literature [435][434][154][97]. Note that we only judge this approach as an approximation. Considering the problem in a rigorous manner, the traps always follow the gate bias with a retardation. The transition occurs when the splitting between the Fermi level connected with the current steady-state occupancy function and some ``Fermi level'' associated with the trap occupancy function exceeds a value of a few . After this point the splitting progresses fast in time. This idea to calculate deserves further investigations.
Let us assume that the MOS system is in the steady-state conditions before applying the falling edge of the gate pulse. Note that this assumption is invalid for short and low , as is discussed at the end of this section. At the beginning of the falling edge, the change in the total number of occupied traps occurring in the steady-state emission is given by

 

where is the steady-state occupancy function at the current gate bias . Considering solely the electron capture and the electron emission it follows

 

The factor can be simply calculated by

 

For a bulk of -type uniformly doped in a concentration

 

The term equals to at the falling edge. The function
, occurring as the subintegral weighting function in 3.69, reduces to after a replacement . The latter function is peaked at and yields the integral of 1 in the interval . Consequently, expression 3.69 may be approximated by

 

On the other hand, following [97] we write

 

in the non-steady-state emission mode which begins at . Note that relationship 3.74 is consistent with 3.66. Equaling expression 3.73 for and expression 3.74 for we obtain the transcendental equation

 

where and . This equation is solvable with respect to by employing a fixed point linear iteration scheme. The scheme converges absolutely, since the right-hand-side is a contractive transformation. From the solution the level follows evidently. The threshold voltage at the transition point is given by

 

where is the solution of 3.75.

According to expression 3.67 the emission level lies below the level , but close to it if the emission time is short and/or is long. In the subthreshold region and for a short , equals to . In this case and is close to . In strong inversion, and hold, the second term in the brackets at the right-hand-side in 3.66 is negligible and is independent of , and . The cases for long and short are more complicated. Then, and . It is expected that splits from . These cases are not analyzed here.
The emission time for electrons at the falling edge of the trapezoidal gate pulse is approximated by

    

Note that in the presence of the source-bulk bias , the level should be corrected by the back-bias, as is done in 3.77- 3.80.

Accounting for the electron emission at the falling edge, the charge-pumping current is given by expression 3.63 but with replaced by .



next up previous contents
Next: Processes at the Up: 3.3.1 Rigorous Analysis of Previous: Charge-Pumping Threshold and



Martin Stiftinger
Sat Oct 15 22:05:10 MET 1994