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Up: 8.2 Photoresist Exposure and
Previous: 8.2.3 Printing of a
Figure 8.27:
Cross sections of the resist profiles of the contact holes printed
over a planar silicon substrate (upper: coherent, middle: circular,
lower: quadrupole; left: best focus, right: 1 
m defocus above).
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Figure 8.28:
Cross sections of the resist profiles of the contact holes printed
over a dielectric oxide step (upper: coherent, middle: circular,
lower: quadrupole; left: best focus, right: 1 
m defocus above).
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Figure 8.29:
Cross sections of the resist profiles of the contact holes printed
over a reflective a-silicon step (upper: coherent, middle: circular,
lower: quadrupole; left: best focus, right: 1 
m defocus above).
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Heinrich Kirchauer, Institute for Microelectronics, TU Vienna
1998-04-17
![\resizebox{14.8cm}{!}{\psfrag{xlab}{$x$\space [$\mu$ m]}
\psfrag{zlab}{$z$\space...
... 309 nm}
\psfrag{18.9}{\footnotesize 290 nm}
\includegraphics{REcutsPlanar.eps}}](img1423.gif)
![\resizebox{14.8cm}{!}{\psfrag{xlab}{$x$\space [$\mu$ m]}
\psfrag{zlab}{$z$\space...
...ze 272 nm}
\psfrag{18.3}{\footnotesize 281 nm}
\includegraphics{REcutsDiel.eps}}](img1425.gif)
![\resizebox{14.8cm}{!}{\psfrag{xlab}{$x$\space [$\mu$ m]}
\psfrag{zlab}{$z$\space...
...ze 270 nm}
\psfrag{18.0}{\footnotesize 277 nm}
\includegraphics{REcutsRefl.eps}}](img1427.gif)