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References

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A.R. Alvarez, B.L. Abdi, D.L. Young, H.D. Weed, J. Teplik, and E.R. Herald. Application of Statistical Design and Response Surface Methods to Computer-Aided VLSI Device Design. IEEE Trans.Computer-Aided Design, 7(2):272-288, 1988.

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B. Baccus, D. Collard, P. Ferreira, V. Senez, and E. Vandenbossche. IMPACT-4 User's Guide, February 1995. Version 4.7.

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C. Fischer, P. Habas, O. Heinreichsberger, H. Kosina, Ph. Lindorfer, P. Pichler, H. Pötzl, C. Sala, A. Schütz, S. Selberherr, M. Stiftinger, and M. Thurner. MINIMOS 6.0 User's Guide. Institute for Microelectronics, Technical University Vienna, March 1994.

FHS93
F. Fasching, S. Halama, and S. Selberherr, editors. Technology CAD Systems, Wien, 1993. Springer.

Fis94
C. Fischer. Bauelementsimulation in einer computergestützten Entwurfsumgebung. Dissertation, Technische Universität Wien, 1994.

FTS94
F. Fasching, W. Tuppa, and S. Selberherr. VISTA-The Data Level. IEEE Trans.Computer-Aided Design, 13(1):72-81, 1994.

GG91
TCAD Framework Group and SPR Working Group. Semiconductor Process Representation Information Model V0.2.2. Technical Report Document Number 71, CAD Framework Initiative, Austin, Texas, August 1991.

GMW95
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Hal94
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HB93
P.J. Hopper and P.A. Blakey. The MASTER Framework. In Fasching et al. [FHS93], pages 275-292.

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S. Halama, F. Fasching, C. Fischer, H. Kosina, E. Leitner, Ch. Pichler, H. Pimingstorfer, H. Puchner, G. Rieger, G. Schrom, T. Simlinger, M. Stiftinger, H. Stippel, E. Strasser, W. Tuppa, K. Wimmer, and S. Selberherr. The Viennese Integrated System for Technology CAD Applications. In Fasching et al. [FHS93], pages 197-236.

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HPW91
G. Hobler, P. Pichler, and K. Wimmer. PROMIS 1.5 User Guide. Institut für Mikroelektronik, Technische Universität Wien, 1991.

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Ins96a
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Ins96b
Institute for Microelectronics, Technical University Vienna. VISTA Documentation 1.3-2, PIF Application Interface Manual, June 1996.

Ins96c
Institute for Microelectronics, Technical University Vienna. VISTA Documentation 1.3-2, VISTA Visualization Tool, June 1996.

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KFBS95
N. Khalil, J. Faricelli, D. Bell, and S. Selberherr. The Extraction of Two-Dimensional MOS Transistor Doping via Inverse Modeling. IEEE Electron Device Lett., 16(1):17-19, 1995.

KGMB94
S. Kleinfeldt, M. Guiney, J.K. Miller, and M. Barnes. Design Methodology Management. Proc.IEEE, 82(2):231-250, 1994.

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KKW93
W. Kanert, N. Krischke, and K. Wiesinger. Optimization of DMOS Transistors for Smart Power Technologies by Simulation and Response Surface Methods. In Selberherr et al. [SSS93], pages 213-216.

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P.R. Kristoff and D.P. Nunn. The Process Specification System for MMST. IEEE Trans.Semiconductor Manufacturing, 8(3):262-271, 1995.

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H. Kirchauer, R. Plasun, M. Radi, S. Selberherr, and R. Strasser. VISTA Status Report. Technical report, Institute for Microelectronics, Technical University Vienna, December 1996.

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B.W. Kernighan and D.M. Ritchie. The C Programming Language. Prentice-Hall, 1988.

KS96
H. Kirchauer and S. Selberherr. Rigorous Three-Dimensional Photolitography Simulation Over Nonplanar Structures. In G. Baccarani and M. Rudan, editors, ESSDERC'96 - 26th European Solid State Device Research Conference, pages 347-350, Gif-sur-Yvette Cedex, France, 1996. Editions Frontieres.

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M.E. Law. Grid Adaption Near Moving Boundaries in Two Dimensions for IC Process Simulation. IEEE Trans.Computer-Aided Design, 14(10):1223-1230, 1995.

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J. Mar. The Application of TCAD in Industry. In SISPAD'96 [SIS96], pages 139-145.

Mas95
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H. Masuda, F. Otsuka, Y. Aoki, S. Sato, and S. Shimada. Response Surface Methods for Submicron MOSFETs Characterization with Variable Transformation Technology. IEICE Trans., E 74(6):1621-1633, 1991.

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MS96
R. Martins and S. Selberherr. Layout Data in TCAD Frameworks. In Modelling and Simulation, pages 1122-1126. Society for Computer Simulation International, 1996.

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W.G. Oldham, A.R. Neureuther, C. Sung, J.L. Reynolds, and S.N. Nandgaonkar. A General Simulator for VLSI Lithography and Etching Processes: Part II-Application to Deposition and Etching. IEEE Trans.Electron Devices, ED-27(8):1455-1459, 1980.

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H. Pimingstorfer. Integration und Anwendung von Simulatoren in der CMOS-Entwicklung. Dissertation, Technische Universität Wien, 1993.

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Ch. Pichler, N. Khalil, G. Schrom, and S. Selberherr. TCAD Optimization Based on Task-Level Framework Services. In Ryssel and Pichler [RP95], pages 70-73.

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Pla96
R. Plasun. HDX Library, August 1996. Internal document, Institute for Microelectronics, TU Vienna.

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Ch. Pichler and S. Selberherr. Process Flow Representation within the VISTA Framework. In Selberherr et al. [SSS93], pages 25-28.

PS93b
Ch. Pichler and S. Selberherr. Rapid Semiconductor Process Design within the VISTA Framework: Integration of Simulation Tools. In M.H. Hamza, editor, Proceedings of the IASTED International Conference, Modelling and Simulation, pages 147-150, Pittsburgh, PA, USA, 1993. The International Association of Science and Technology for Development.

PS95
H. Puchner and S. Selberherr. An Advanced Model for Dopant Diffusion in Polysilicon. IEEE Trans.Electron Devices, 42(10):1750-1755, 1995.

Puc96
H. Puchner. Advanced Process Modeling for VLSI Technology. Dissertation, Technische Universität Wien, 1996.

RHS95
G. Rieger, S. Halama, and S. Selberherr. A Programmable Tool for Interactive Wafer-State Level Data Processing. In Ryssel and Pichler [RP95], pages 58-61.

Rie96
G. Rieger. Ein graphischer Editor für Entwurf von Halbleiterbauteilen. Dissertation, Technische Universität Wien, 1996.

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H. Ryssel and P. Pichler, editors. Simulation of Semiconductor Devices and Processes, volume 6, Wien, 1995. Springer.

RSS95
M. Rottinger, T. Simlinger, and S. Selberherr. Two-Dimensional Transient Simulation of Charge-Coupled Devices Using MINIMOS NT. In Ryssel and Pichler [RP95], pages 440-443.

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T. Simlinger, H. Kosina, M. Rottinger, and S. Selberherr. MINIMOS-NT: A Generic Simulator for Complex Semiconductor Devices. In H.C. de Graaff and H. van Kranenburg, editors, ESSDERC'95 - 25th European Solid State Device Research Conference, pages 83-86, Gif-sur-Yvette Cedex, France, 1995. Editions Frontieres.

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Technology Modeling Associates, Inc., Palo Alto, CA. TMA TSUPREM-4, Two-Dimensional Process Simulation Program, Version 6.2, June 1995.

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Tup96
W. Tuppa. VMake - A CASE-Oriented Configuration Management Utility. Dissertation, Technische Universität Wien, October 1996.

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N.H.E. Weste and K. Eshraghian. Principles of CMOS VLSI Design. Addison Wesley, second edition, 1993.

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K. Wimmer. Two-Dimensional Nonplanar Process Simulation. Dissertation, Technische Universität Wien, 1993.

WKKS93
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R.W. Yuen, B. Gogoi, and C.H. Mastrangelo. Toward the Automatic Synthesis of Process Flows for Semiconductor Devices. In Int. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits NUPAD V, pages 117-120, Honolulu, 1994.
[2]All PhD theses from the Institute for Microelectronics are available on the World Wide Web at http://www.iue.tuwien.ac.at/. At the same address, links to the VISTA Documentation are provided.



Christoph Pichler
Thu Mar 13 14:30:47 MET 1997