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**Up:** 9.3 Inverse Modeling of
** Previous:** 9.3.4 Handling Multiple Devices

Having this comprehensive **model** (Figure 9.7)
which delivers match metrics associated to a set of doping profile
parameters for each of our measured operating points, we are able to
perform the actual inverse modeling procedure using *SIESTA*'s
optimization environment. Therefore, we define the optimization
experiment based on *LMMIN* as shown in
Example 9.6.

In this experiment description we define *n3*,
*ysigma3*, *n4*, and *ysigma4* as free parameters
of the optimization. Therefore, the optimization tool will search for
the shape and the peak concentration of the threshold adjust implant
and for the well doping of the measured devices.
Figure 9.8 shows the inverse modeling procedure at
work. Plots display the match vector for each iteration, and for the
evolution of doping profile parameters. Figure 9.9 displays
the job farming system and as one can see from this screen shot,
computation hosts are utilized as far as possible. The user of this
system is able to produce Postscript files of all plots, which can be
displayed in the GUI, as it might be necessary for documentation
purposes.

** Next:** 9.3.6 Simulation Results
**Up:** 9.3 Inverse Modeling of
** Previous:** 9.3.4 Handling Multiple Devices
*Rudi Strasser *

1999-05-27