Christian Doppler Laboratory for Multi-Scale Process Modeling of Semiconductor Devices and Sensors – at the Institute for Microelectronics, TU Wien

We develop physical models of semiconductor fabrication. They link atomistic surface processes and plasma reactors to the shape of the structures on the wafer, and we release them in the open-source process simulator ViennaPS.

The laboratory, directed by Lado Filipovic, is part of the Institute for Microelectronics at TU Wien and works with its company partner Silvaco. It started in October 2022 and runs until September 2029.

Map of simulation methods by length and time scale, from DFT and molecular dynamics through kinetic Monte Carlo and drift-diffusion to the reactor and the circuit — Length and time scales of process (red) and device (blue) simulation, and the quantities passed between the models.

Research

Atomistic surface interactions from DFT and molecular dynamics
Implantation and annealing of dopants in silicon carbide
Feature-scale simulation of etching and deposition
Process emulation of complete device structures
Surrogate models and calibration with machine learning
Open-source software in the ViennaTools suite

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