Erasmus Langer
Siegfried Selberherr
Oskar Baumgartner
Hajdin Ceric
Johann Cervenka
Otmar Ertl
Wolfgang Gös
Klaus-Tibor Grasser
Philipp Hehenberger
René Heinzl
Gerhard Karlowatz
Markus Karner
Hans Kosina
Gregor Meller
Goran Milovanovic
Mihail Nedjalkov
Roberto Orio
Vassil Palankovski
Mahdi Pourfath
Franz Schanovsky
Philipp Schwaha
Franz Stimpfl
Viktor Sverdlov
Oliver Triebl
Stanislav Tyaginov
Martin-Thomas Vasicek
Stanislav Vitanov
Paul-Jürgen Wagner
Thomas Windbacher

Paul-Jürgen Wagner
Dipl.-Ing.
pjwagner(!at)iue.tuwien.ac.at
Biography:
Paul-Jürgen Wagner was born in Vienna, Austria, in 1979. He studied electrical engineering at the Technische Universität Wien, where he received the degree of Diplomingenieur in 2007. He joined the Institute for Microelectronics in February 2007, where he is currently working on his doctoral degree. His interests include device modeling, analog circuit design, and electric measurement methods.

Measurement Techniques for MOS Reliability Issues

Negative Bias Temperature Instability (NBTI) is one of the most pressing reliability issues in modern CMOS semiconductors. It is caused by application of a negative gate voltage to a MOSFET and manifests itself as a shift in the device parameters, first and foremost the threshold voltage. The effect is considerably enhanced at elevated temperatures, and p-channel FETs are more affected than n-channel FETs. Although a great deal of effort is going into the research on this topic, there is still no universally accepted microscopic model.
As with modeling in general, accurate and reliable measurements are the key to successful model development. Especially with sophisticated devices in the sub-micron range, second-order effects cause the measured device characteristics to deviate considerably from the idealized closed-form analytical solutions derived from the semiconductor equations. It is therefore important that measurement data be assessed by means of simulation of the device within the chosen measurement setup. This is true to an even greater extent in the case of NBTI, since measurement data from different groups often do not match and sometimes even contradict each other. This discrepancy is largely due to the fact that the relaxation of NBTI sets in very quickly, but lasts for several decades in time.
One particular measurement method called On-The-Fly (OTF) avoids relaxation by continuously stressing the device while measuring the drain current degradation. Since no degradation is 'lost' during some measurement cycles, this method was considered superior in the past. Recently, the concern was raised regarding the extent to which errors in the initial measurement of the drain current, to which all subsequent drain current readouts are compared to, may impair the calculated degradation of the threshold voltage. Our simulations clearly showed that uncertainties in the initial drain current measurement seriously impact the extracted threshold voltage shift. In addition, mobility variations induced by NBTI may add spurious threshold voltage shifts.


The figure shows the 'true' degradation as determined by the simulator (open black circles), the extracted threshold voltage shift for three different variants of OTF (dotted lines when the simulation is without mobility degradation, solid lines when mobility variations are included), and some measurement data of real devices (solid red squares). To show the strong effect of faulty initial drain current measurements, the simulation was carried out with three different time delays between the start of the stress and the actual first measurement (the data are scaled by a factor of 5 for better readability).


Home | Activities | Staff | Publications | Sponsors | Contact Us