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3.1 Isotropic Etching/Deposition

For the acceleration of isotropic processes we have evaluated two different approaches. The first one uses spherical segments, in the latter linear structuring elements normal to the surface are applied. The two methods are described in Sections 3.1.1 and 3.1.2 and compared against each other and against the original algorithm in Section 3.1.3.


Subsections [<] [^] [>] [TOC] Prev: 3 Topography Algorithms Up: 3 Topography Algorithms Next: 3.1.1 Spherical Segments
W. Pyka, R. Martins, and S. Selberherr: Optimized Algorithms for Three-Dimensional Cellular Topography Simulation