Today a semi-empirical model equation (4.5) is widely used to extrapolate interconnects' time to failure under accelerated test conditions compared to operating conditions.
Based on experimental observations [3], the value of the current density exponent
in (4.5) is found to be
for the nucleation failure mechanism in which failure is dominated by the time required to build-up a critical stress or a critical vacancy concentration.
For the void-growth mechanism, in which failure is determined by the growth of the void to the critical size, the current density exponent is
.
Considering the nucleation failure mechanism for arbitrary given critical vacancy concentration
, Shatzkes and Lloyd [80] derived following the equation for the time to failure,