4.3  Impact of the anisotropy on the critical thickness criterion

Steeds developed a procedure to calculate the energy of one infinite straight dislocation in the bulk of an infinite material  [72], which is considered anisotropic with a certain crystallographic symmetry. The result for the hexagonal symmetry is briefly described in  [28].

Here, this treatment is adopted in order to calculate the energy (with and without the contribution of the dislocation core, see Chapter 3.2) for a dislocation whose slip system is 131123⟩{1122} or 131123⟩{1101} in Al0.2Ga0.8N and in In0.2Ga0.8N (see Figure 4.4). The same treatment with the appropriate elastic constants is used to calculate the energy for the so called 60 dislocation slip system 110⟩{111} in Si 0.8Ge0.2 (see Figure 4.5).


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Figure 4.4: The two most favorable slip systems in the systems AlxGa1-xN/GaN and InxGa1-xN/GaN: a) 1123⟩{1122} observed by Srinivasan  [71] and b) 1123⟩{1101} determined by Jahnen  [33].


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Figure 4.5: The slip system 110⟩{111} of the 60 dislocation shown in the FCC structure.

In the following, the difference between the dislocation energy dEddy and the work dWdy done by the misfit stress field for each alloy is discussed. When the resulting value is positive, fully coherent accommodation of the misfit strain is energetically preferred, while for negative values introduction of misfit dislocations becomes favored. The highest film thickness yielding the difference of 0 indicates the equilibrium critical thickness . The resulting values for the three different alloys as a function of the film thickness are plotted in Figures 4.6,  4.7, and 4.8. Each figure has two sets of curves, one for the Freund,(isotropic elasticity) and one for the Steeds (anisotropic elasticity) procedure. For all systems investigated here, the anisotropy lowers the critical thickness . Additionally, it turns out that the inclusion of the integral along the core surface S3 (values labelled “with Ecs” in the figures. For the description of Ecs see Section 3.2) has in all cases only a negligible impact (or at least on order of magnitude smaller effect than the correct crystal symmetry) on the predicted critical thickness (see Table 4.2).


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Figure 4.6: dEddy -dWdy as function of the Al0.2Ga0.8N film thickness. dEddy is calculated assuming isotropic (Freund model (F)) and anisotropic (Steeds model (S)) elasticity, with or without the evaluation of the integral along the core surface Ecs. dWdy is calculated according to equation (4.9). The critical thickness values of an Al0.2Ga0.8N film grown on a GaN substrate are indicated by a circle.


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Figure 4.7: Same as in Figure 4.6 but for an In0.2Ga0.8N film grown on a GaN substrate.


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Figure 4.8: Same as in Figure 4.6 but for a Si0.8Ge0.2N film grown on a Si substrate.