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#

5.2 Benchmarks

For checking the accuracy and stability of the resist development simulation,
benchmark examples as proposed in [24] have been simulated. For
these examples the local development rate of the cells is given as
mathematical expression of their position . The expressions are
subdivided into several equations which describe the impact of different
components of the electro-magnetic field. The final rate is given by the
superposition of the interfering contributions.

**Subsections**

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W. Pyka: Feature Scale Modeling for Etching and
Deposition Processes in Semiconductor Manufacturing