In order to promote the understanding of the eNMP model,
and
will be
derived analytically in the following. The time constants observed in TDDS can be
calculated on the basis of first passage times of a two-step process (see Fig. 7.5).
, provided that it was in the state
but not in
state B at the beginning. In the eNMP model, one is only interested in the
transition times between the stable states
and
, in which the defect dwells
most of the time. Since the metastable states
and
are energetically
higher than their corresponding stable counterparts
and
, the defect
only remains temporarily in these metastable states. This is in agreement
with the condition for the first passage time that the system must not be
in state B at the beginning. As a result, the transition rates between the
states
and
can be reasonably described as the inverse of first passage
times.
to
. The first passage time of such a process is calculated by equation (7.52).
Consider that the transition rate
, indicated by the dashed arrow, does
not enter this equation.The various transition pathways allowed in the eNMP model are summarized in the state diagrams of Fig. 7.6. The corresponding first passage times for the hole capture or emission read
and
. The superscript of
denotes the intermediate
state, which has been passed through during a complete capture or the emission
event. Note that there exist two competing pathways for a hole capture event,
namely one over the intermediate state
and one over
. Of course, the
same holds true for a hole emission event.For studying the field dependence of these capture and emission times, the definition
(
) is used for
and
in the expression for the NMP barriers (7.17):


Recall that the hole capture process can proceed from state
over one of the
metastable states
or
to the final state
according to the state diagram of
Fig. 7.3. The corresponding capture time constants are denoted as
and
,
respectively, and will be discussed in the following. When the transition pathway
is preferred, the capture time constant in the form of (7.52) is given by

is
characterized by three distinct regimes, namely B, C, and D in Fig. 7.7.
is the dominant
rate meaning that the transition2
proceeds much faster than
(cf. Fig. 7.8). Thus the pace
of the complete capture process (
) is determined by the second
transition
, which is much slower and has a time constant of
.
Since this second step is only thermally-activated,
does not depend
on the oxide field. This is consistent with equation (7.65) at extremely high
negative oxide fields, at which both exponential terms become negligible
compared to
.
approaches the
order of magnitude of
and even falls below
. Then the transition
over the thermal barrier
is undergone immediately after the
defect has changed from the state
to
. Thus the kinetics of the
hole capture process are governed by the forward rate of the NMP process
. As a result,
shows an exponential oxide field dependence,
which is reflected in the first term of equation (7.65). Note that the second
term is negligible due to its steeper exponential slope within this regime.
is already outbalanced by
its reverse rate
(see Fig. 7.8) and the ratio of both rates determines
the oxide field dependence. This gives an increased exponential slope
originating from the second term of equation (7.65).The transitions between these three regimes are smooth so that a curvature appears
in the time constant plots of
.
(A, B, C, and D) are separated by
the thin vertical lines and labeled by the green circles with the capital letters.
The dotted curves
show the capture processes over a metastable state
.
The field dependence of
within a certain regime is shown by the dashed
curve, which becomes constant if
is insensitive to
. Right: The same
but for the hole emission time constants with the regimes (E, F, and G).
. With higher oxide fields (B
D) the blue potential (neutral
defect) is raised relative to the red one (positive defect). This is associated with
an increase of
and a decrease of the reverse rate
. In contrast to the
charge transfer reactions
and
, the thermal transition
is
not affected by the oxide field.However, when the transition over the metastable state
is favored (regime A),
the capture time constant can be again formulated as a first passage time:
is situated above the state
by definition,
holds. Therefore, the expression (7.75) can be approximated by
which is characterized by only two regimes (A’ and A”) now.
is located relatively high
(see Fig. 7.9) and the transition rate
exceeds
. Therefore, the
first term of expression (7.76) vanishes and the field-insensitive transition
with a time constant of
dominates
.
is shifted downwards in the
configuration coordinate diagram, thereby decreasing the transition rate
. At a certain oxide field,
falls below
and the first term of
the expression (7.76) becomes dominant (regime A”). As a consequence,
governed by the field-dependent transition
, which causes
the exponential term of the expression (7.66). Depending on the value of
, there exists a crossing point between the curves
and
,
marking the transition between the regime A and B. It is noted that the
NMP transitions in the regimes A, B, and C also involve a nearly negligible
field dependence, which has already been present in the TSM for
instance.The transition between A’ and A” yields a kink, which is visible in
of Fig. 7.7 (dotted line) but not in the overall hole capture time given by

.Also the hole emission process has the possibility to proceed over either the state
or
, with
and
being the corresponding emission time constants (see
Fig. 7.10). For the transition pathway over
the emission time constant can be
expressed as:

applies,
has only two regimes, labeled with the capital letters
F and G in Fig. 7.7. 
is shifted
upwards so that
dominates and the field-dependent NMP transition
determines the pace of
. The sensitivity of
to
the oxide field is reflected in the exponential term of equation (7.67).
proceeds
much faster than
over the purely thermal barrier
. Thus,
is determined by the field-insensitive transition
with a time
constant of
. It is important to note that the field independence
of this regime is experimentally observed in the time constant plots of
‘normal’ defects (cf. Fig. 7.4 left).
.At a low oxide field (regime E), the state
is further shifted down, which
speeds up the NMP transition
and allows the pathway over the
metastable state
. The corresponding emission time constant
is given by

the rate
is negligible compared to
and
and the above equation simplifies to 
and
and is marginally disturbed by the rate
. Then the states
and
can be assumed to be in quasi-equilibrium. 
holds so that the trap occupancy
is given by 
is
equivalent to
. Furthermore, this equation can be used to simplify the
equation (7.68) as follows: 
falls below
at a certain relaxation voltage, the state
becomes occupied
and the emission time
is determined by the field-independent transition
with the time constant
. By contrast, if
is raised above
, the state
is underpopulated thereby slowing down the hole emission process. This occupancy
effect is reflected in the second term, which reacts sensitive to changes in
.
The overall hole emission time
follows from

is shifted
below state
,
reaches its minimum value and falls below
. The resulting
drop in
is observed as the field dependence characterizing ‘anomalous’ defects
at weak oxide fields in TDDS experiments. As pointed out in Fig. 7.4, the
drop of
occurs when the minimum of the state
passes that of state
, and is thus related to the exact shape of the configuration coordinate
diagram.