Impact of Charge Transitions at Atomic Defect Sites on Electronic Device Performance
4.2 Charge trapping in monolayer tungsten diselenide (1L-WSe)
The content presented in this section has been published in [237].
Both the text and the figures have been adapted from this publication.
For the study in [237], a WSe film with native point defects was transferred onto a back-gate stack of 25 nm AlO on sputter-deposited
Pt/TiN on p-Si substrate. An RTN signal in was observed in these devices when a negative back gate voltage was applied at low temperatures ( K), where fast nuclear tunneling
dominates the charge transitions. At room temperature, energy supplied by phonons allows for overcoming the classical barrier for charge trapping as described by the NMP model (see Section 2.1.4). Consequently, defects in the oxide also become electrically active and the distinct RTN traces disappear, as multiple RTN traces, associated with different defects, superimpose. This
underscores the importance of fabricating ultra-scaled devices to observe and investigate the RTN phenomenon. technology computer aided design (TCAD) simulations confirmed that these RTN traces originate from hole trapping
at fast defects in the substrate, as oxide defects freeze out at low temperatures. Furthermore, TCAD suggested that the responsible defects have a trap energy of approximately 100 meV or less above the VBM and a
smaller than 150 meV. To explore the atomic origin of these phenomena, DFT calculations were carried out, which will be described in the following.
4.2.1 Defect types
The 2D film studied in [237] has a crystalline 2H-WSe structure with several point defects, including Se vacancies (), antisite defects with
Se substituting W () and W substituting Se (), as well as W vacancies (). These defect types have already been identified as the most abundant in monolayer
WSe [238].
In this thesis, the hole trapping properties of and are investigated. Both defect types are possible candidates for causing the detected RTN signal via hole trapping and detrapping at the
defect site. While can form in WSe, this defect type does not offer a possible state for hole trapping, as a hole cannot localize at the defect but rather creates a delocalized state
inside the valence band in accordance with [239]. Therefore, the will not be considered as a potential hole trap in the following.
Defect calculations were carried out in a monolayer WSe supercell containing 432 atoms with 40 Å of vacuum perpendicular to the monolayer to minimize spurious interactions with periodic images. More details about the
computational setup for the DFT calculations can be found in Appendix E. Monolayers containing one single defect were structurally relaxed with DFT in both their neutral and positive
charge state. The consists of a single missing W atom in the WSe lattice as shown in Fig. 4.19 for the relaxed atomic defect structures, both neutral (a)
and positively charged (b).
Figure 4.19: Atomic structure of a tungsten vacancy () in a WSe monolayer geometry optimized with DFT. (a) Neutral charge state with HOMO (blue bubbles) localized at Se sites; (b) positive charge state
with hole (red bubble) localized at Se sites. W atoms are drawn in pink, Se atoms in yellow.
The electronic wave functions of the localized defect orbitals are depicted for an isovalue of 0.05 e/Å. Hereby, blue bubbles represent the HOMO of the neutral structure, while red bubbles depict the LUMO of the positively
charged system. For the neutral , the HOMO is concentrated at the Se atoms surrounding the vacancy. When a hole is added to the system, it localizes at these Se atoms, following atomic relaxations.
The second investigated defect type is stable when the Se moves away from the W lattice position and stabilizes in the center of four adjacent Se atoms near the defect site as shown in Fig. 4.20.
Figure 4.20: Atomic structure of a selenium antisite () in a WSe monolayer geometry optimized with DFT. (a) Neutral charge state with HOMO depicted as blue bubbles; (b) positive charge state with
hole (LUMO) drawn as red bubbles.
The HOMO of the neutral structure is localized around several W of the defect site. An added hole localizes at the W atoms around the defect site, following small atomic relaxations.
NMP characterization
Both defect types, and the , introduce unoccupied and occupied Kohn–Sham (KS) states in the WSe band gap, which can host up to two electrons in opposite spin states as shown in
Fig. 4.21(a).
Figure 4.21: (a) Electronic Kohn-Sham (KS) levels from hybrid functional DFT in the WSe band gap introduced by a (left) and an (right). Occupied and empty KS levels are drawn
as blue and red bars, respectively, with the two possible spin states depicted as up- and downward arrows. (b) CTLs of the charge transition for the W vacancy (, left) and the Se antisite (, right). The CTLs and KS levels are given with respect to the valence band maximum of the pristine WSe monolayer.
The occupied KS levels are closely above the VBM, indicating that these defects can potentially be classified as shallow hole traps, and might therefore be responsible for generating the RTN signal measured in the device. To
confirm this assumption, the thermodynamic CTLs of both defect types are calculated for single hole trapping are given in Table 4.4 and are depicted in Fig. 4.21(b). Compared to the KS levels of a defect, which are directly obtained from DFT calculations of a fixed atomic configuration, the CTL also accounts for the energy change of
the system upon charge trapping due to atomic relaxations as described in Section 2.1.3. Thus, CTLs can be related to experimentally detected trap levels. Finite size corrections of the total
energy compensating for electrostatic potential offsets and spurious interactions due to periodic boundary conditions in charged supercells were carried out using the CoFFEE code [240], which implements the FNV correction scheme (see Section 2.2.1) for 2D systems. The KS states and CTLs of
both defect types are shown in the context of the electronic band gap of a WSe monolayer.
Furthermore, the relaxation energies for hole capture () and emission () at the defect sites as described in Section 2.1.3 and the configuration coordinate change as described in Section 2.1.2 were calculated. The results are
presented in Table 4.4.
Table 4.4: Energetic configurations of the hole trapping defect types and from hybrid functional DFT. CTLs for hole transitions () are given with respect to the valence band maximum of the pristine monolayer.
Defect:
[meV]
[meV]
[meV]
[amu Å]
:
45
23
23
3.68
:
97
196
117
0.94
For both the and the , the hole trap level lies closely above the VBM of the pristine bulk, with only small relaxation energies for hole capture as well as for hole emission. Both defect types
can therefore be classified as hole traps and have trapping and relaxation energies close to those of the TCAD predictions as presented in [237]. Therefore, it is concluded that both and the are probable defect candidates to explain the RTN signal detected in the
investigated devices.