On February 20, our institute celebrated the opening of the Christian Doppler Laboratory for Multi-Scale Process Modeling of Semiconductor Devices and Sensors. With a panoramic view over historic Vienna at TUtheSky, the director of the new research laboratory Lado Filipovic warmly welcomed the representatives of the TU Wien rectorate, the representatives of the Christian Doppler Forschungsgesellschaft, managers and researchers from the industrial project partner Silvaco Inc, as well as colleagues and friends working at the Technische Universität Wien.

The aim of this research project is to efficiently combine process simulation at extreme time and space scales. This will ensure that novel materials can be properly modeled using a physical and predictive approach, which goes beyond the current semi-empirical methods. Currently, many models are based on calibrated models which were initially built on Silicon fabrication.

For further information, refer to the news releases from the TU Wien Press, APA, Science@ORF and Wirtschaftszeit.

We congratulate our colleague Lado for this great achievement and we are looking forward to some outstanding results!