"Reliability of Scalable MoS2 FETs with 2 nm Crystalline CaF2 Insulators" Paper

2D Materials paper

We are thrilled to announce that on July 1th the paper entitled “Reliability of scalable MoS2 FETs with 2 nm crystalline CaF2 insulators” authored by our colleagues Dr. Yury Illarionov, Dipl.-Ing. Theresia Knobloch, Dr. Mischa Thesberg, Dr. Michael Waltl and Prof. Tibor Grasser was published in 2D Materials.

The full technical paper is available in the journal's 6th Volume.

Congratulations to our colleagues for publishing this important work.