We’re proud to announce that Luiz Felipe Aguinsky won the Best Poster Award at EuroSOI-ULIS 2021 (Joint International EuroSOI Workshop and International Conference on Ultimate Integration on Silicon) in Caen, France for his paper “Feature-Scale Modeling of Low-Bias SF6 Plasma Etching of Si”. The research was conducted as part of a collaboration between our Christian Doppler Laboratory for High Performance TCAD, the Institute of Sensor and Actuator Systems (TU Wien), the Vienna Center for Quantum Science and Technology (University of Vienna), and Silvaco, Inc.