Philipp Haslhofer was born in Linz, Austria, in 1995. He earned his Bachelor's degree in Technical Physics and his Master's degree (MSc) in Computational Science and Engineering (CSE) from TU Wien in 2024. In May 2025, he joined the Institute of Microelectronics as a researcher in the Christian Doppler Laboratory for Multi-Scale Process Modeling of Semiconductor Devices and Sensors. His current research focuses on the simulation of atomic layer deposition (ALD) and atomic layer etching (ALE), as well as the development of the ViennaPS process simulation library.