Alexander Toifl was born in St. Pölten, Austria, in 1993. He studied at the TU Wien where he received the BSc. degree in Electrical Engineering (2016) and the Diplomingenieur degree in Microelectronics and Photonics (2018). He joined the Institute for Microelectronics in August 2018 as a research assistant. Alex's scientific interests include computational modeling (post-implantation annealing of GaN and SiC) and high performance numerical approaches (non-planar epitaxy) for process TCAD.