Erasmus Langer
Siegfried Selberherr
Oskar Baumgartner
Markus Bina
Hajdin Ceric
Johann Cervenka
Lado Filipovic
Wolfgang Gös
Klaus-Tibor Grasser
Hossein Karamitaheri
Hans Kosina
Hiwa Mahmoudi
Alexander Makarov
Marian Molnar
Mahdi Moradinasab
Mihail Nedjalkov
Neophytos Neophytou
Roberto Orio
Dmitry Osintsev
Vassil Palankovski
Mahdi Pourfath
Karl Rupp
Franz Schanovsky
Anderson Singulani
Zlatan Stanojevic
Ivan Starkov
Viktor Sverdlov
Oliver Triebl
Stanislav Tyaginov
Paul-Jürgen Wagner
Michael Waltl
Josef Weinbub
Thomas Windbacher
Wolfhard Zisser

Anderson Singulani
MSc
singulani(!at)iue.tuwien.ac.at
Biography:
Anderson Pires Singulani was born in Rio de Janeiro, Brazil, in 1984. He studied Electrical Engineering at the State University of Rio de Janeiro and at the Pontifical Catholic University of Rio de Janeiro where he received the master's degree in electrical engineering (nanotechnology) in 2009. He joined the Institute for Microelectronics in May 2011, where he is currently working on his doctoral degree. His scientific interests in the moment are focused on thermo-mechanical simulation of 3D interconnections but he has also interests in numerical analysis, simulation techniques for physical problems, and semiconductor physics.

Thermo-Mechanical Simulation of an Open TSV Technology

Three-dimensional (3D) integration in semiconductor technology provides an alternative to keeping the current pace of miniaturization and enhances the capabilities of devices. The advantages can be summarized briefly as increased density, broader functionality, and higher performance per unit area, by making efficient use of the third dimension. However, three- dimensional integration opens up a new myriad of challenges in design and fabrication, which must be overcome in order to achieve large scale production.
There are several ways for implementing 3D integration, however, a great number of ideas involves an interconnection through silicon with a so-called Through Silicon Via (TSV) to bind the different device layers. One issue with TSVs is the mechanical stability regarding temperature changes in the structure, which is the typical scenario during processing with thermal cycles and also in normal device operations. This situation leads to high mechanical stress in the structure in connection with microstructural properties, which weaken the stability of the crystal (dislocations, grain boundaries), and can cause a fracture of the metal layers causing complete failure of a TSV.
Our work addresses this problem in TSV structures with the goal to identify potential failures and to acquire advanced insight towards mechanical reliability. For this purpose we use our tool, titled ViennaFEM, to perform 2D and 3D thermomechanical simulations. Our target structure is a state of the art open TSV technology. It uses wafer bonding and TSVs to directly integrate low output sensors with their associated analog amplification and signal processing circuitry.
With both simulations one can have different, but complementary, perspectives of the thermal-stress development in the structure. In the 2D case it is possible to observe how the stress develops around a sufficiently large structure and this helps to determine regions subjected to fatigue (silicon cracking and crack propagation). However in the 3D case, one can identify stress peaks in the whole structure and can also study the stress development on the surfaces of the structures.


Von Mises stress for a single TSV.



Von Mises stress for a group of 7 TSVs.


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