Erasmus Langer
Siegfried Selberherr
Hajdin Ceric
Johann Cervenka
Siddhartha Dhar
Robert Entner
Wolfgang Gös
Klaus-Tibor Grasser
René Heinzl
Christian Hollauer
Stefan Holzer
Andreas Hössinger
Gerhard Karlowatz
Markus Karner
Hans Kosina
Ling Li
Gregor Meller
Mihail Nedjalkov
Alexandre Nentchev
Vassil Palankovski
Mahdi Pourfath
Philipp Schwaha
Alireza Sheikholeslami
Michael Spevak
Viktor Sverdlov
Oliver Triebl
Enzo Ungersboeck
Martin-Thomas Vasicek
Stanislav Vitanov
Martin Wagner
Wilfried Wessner
Robert Wittmann

Alexandre Nentchev
Dipl.-Ing.
nentchev(!at)iue.tuwien.ac.at
Biography:
Alexandre Nentchev was born in Sofia, Bulgaria, in 1971. He studied electrical engineering at the Technische Universität Wien, where he received the degree of Diplomingenieur in 2004. He joined the Institute for Microelectronics in April 2004, where he is currently working on his doctoral degree. His scientific interests include numerical and analytical field calculation, three-dimensional interconnect simulation and software technology.

Three-Dimensional Interconnect Simulation

The three-dimensional interconnect structure in integrated circuits represents a difficult electromagnetic system. It includes up to seven metalization layers with links for more than one million transistors hosted on a silicon substrate. A series of physical effects are responsible for the limitation of the maximum allowed frequency of modern integrated circuits. Capacitive and inductive coupling give on-chip noise. Resistance, capacitance, and inductance of the interconnect lines cause rise, fall, and delay times. The skin effect forces the current to pass through the surface of the conductors. An overdriven inductive net produces harmful underdamped ringing step response. Power supply integrity is determined by the on-chip ground and power lines inductance combined with the decoupling capacitance. These effects result in functional failure and depend on the spatial distribution of the interconnect lines. These parasitics must be considered in integrated circuit technology during the design process at an early stage. For this reason, highly accurate models and analysis methods are required to predict and optimize the behavior of interconnect lines for a given layout geometry. These challenging tasks can be significantly supported by three-dimensional interconnect simulation.

The three-dimensional finite element method for the computation of partial differential equations derived from the Maxwell equations is used for the numerical electrical and magnetic field calculation. For the interconnect capacitance and resistance extraction, the electric field is calculated by the Poisson equation. The inductance extraction is based on the magnetic field calculation. The dimension of the interconnects in the integrated circuits allows the assumption of dominant magnetic fields. Thus the magnetic field is calculated by the diffusion equation, which is solved using edge finite element methods. These approaches allow inductance, capacitance, and resistance extraction in complex interconnect structures. Analytical electrical and magnetic field evaluation is used to revise the results of the numerical solution.


The current density distribution in the inductor. The skin depth is 10% of the wire profile.



The magnetic field distribution of an inductor.


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